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See Past Events
SPIE Advanced Lithography & Patterning 2026
Join your community as you meet to hear the latest advances in optical lithography, EUV, patterning technologies, metrology, and process integration for semiconductor manufacturing and related applications.
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Feb 22 - Feb 26 2026 San Jose, CA United States San Jose McEnery Convention Center
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SPIE Advanced Lithography & Patterning 2026 February 22, 2026 7:34 AM February 26, 2026 7:34 AM San Jose McEnery Convention Center Join your community as you meet to hear the latest advances in optical lithography, EUV, patterning technologies, metrology, and process integration for semiconductor manufacturing and related applications. /content/entegris-live/en/home/about-us/events/spie-advanced-lithography-2026

Join Us

Learn how Entegris is advancing lithography with innovative filtration and purification solutions that reduce defects and improve process performance. Our experts will share insights that help enable next-generation EUV technologies and higher yields.

Register Now!

Poster Sessions

February 25 I 5:30 pm – 7:00 pm PST I Convention Ctr., Hall B

A Novel Purifier for Acid-Sensitive Applications: Suppressing Dimerization and Metal Impurities in Solvent Systems


Discover how Entegris' next-generation purifier minimizes metal contamination and suppresses proton-driven dimerization in cyclohexanone (CHN), ensuring stability for EUV photoresist and other acid-sensitive applications.

Presenter: Elmer Lin, Senior Scientist, Solutions Design

Photoresist filtration design advancements for process throughput performance and defect reductions


Learn how Entegris’ next-generation UPE filtration technology captures sub-15 nm contaminants while maintaining high flow rates, delivering superior purity and throughput for advanced lithography processes.

Presenter: Vanessa Su, Application Engineer

Ultra-Clean Nylon Filtration for EUV Underlayer Defect Mitigation at the N2 Node


Discover how optimized Nylon membrane technology reduces particle-induced defects in EUV underlayer (UL) processing, enabling cleaner profiles and improved yield for next-generation lithography.

Presenter: Miura Kozue, Lead Engineer, Solutions Engineering

Point-of-Use UPE Membrane Filter Optimization for EUV Chemically Amplified Photoresist


Learn how Entegris’ latest UPE membrane technology reduces bridging defects in EUV photoresists, supporting high-NA lithography and next-generation semiconductor manufacturing.

Presenter: Alex Holmann, Lead Engineer, Solutions Engineering