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Extreme ultraviolet (EUV) photolithography allows chipmakers to reach even smaller nodes, but this process is more sensitive than ever before. Check out our poster presentations to learn how our new and optimized filtration systems help critical EUV photolithography chemicals arrive free from contamination from delivery to point-of-use.
Poster Sessions
February 26 | 5:30 – 7:00 p.m. | Convention Center, Hall 2
EXPLORATION OF UPE MEMBRANE TECHNOLOGY IN POINT-OF-USE EUV CAR PHOTORESIST FILTRATION
Learn how Entegris is helping to enable the development of 5nm semiconductor devices by providing advanced filtration solutions specifically designed for high Numerical Aperture EUV lithography.
Presenter:
Tetsu Kohyama, Manager, Photo Applications
DEVELOPMENT OF ANCILLARY PHOTOCHEMICAL BULK FILTERS TO IMPROVE PARTICLE REMOVAL AND STARTUP TIME IN AUTOMATED DELIVERY SYSTEMS
Discover how to reduce process downtime and improve filter priming speeds using next-generation photolithography filters for ancillary chemical applications.
Presenter:
Patricia Chen, Applications Engineer
DUAL-FUNCTION FILTRATION TO IMPROVE ON-WAFER DEFECTIVITY PERFORMANCE FOR EUV APPLICATIONS
As chipmakers approach the 3 nm process node, photochemical purity becomes a more significant concern. This paper introduces Entegris’ latest filtration technology for photoresist at point-of-use and demonstrates a notable reduction in defectivity.
Presenter:
Masahiko Kubo, Process Engineering Engineer
NTD CARS PURITY DEVELOPMENTS TOWARD SINGLE-PRINT CAPABILITY IN EUV SCANNERS
EUV photolithography applications use chemically amplified resists that can be sensitive to scum defects. Here at Entegris, we’re studying a range of optimized filtration membranes that can reduce defects and achieve lower defect densities, resulting in higher yields and improved performance.
Presenter:
Kozue Miura, Application Development Engineer