For over 40 years, the SPIE Advanced Lithography Symposium has played a key role in bringing together the microlithography communities involved with semiconductor devices, micro-/nano-systems, and related fields. Advances in traditional patterning together with the growth of alternative approaches drive the solutions of these demanding technologies. In the semiconductor field, the challenges of manufacturable, cost-effective lithography continue as patterning is extended further toward physical limits. State-of-the-art processes are being advanced through immersion lithography combined with multiple patterning and design co-optimization. Extreme UV lithography continues to move closer to volume production readiness, with a long string of successes along the way.
Entegris will present the following paper during the interactive poster session at SPIE on Tuesday, February 23rd:
An update on Entegris' EUV pellicle compatible EUV inner pod development
Authors: Huaping Wang, Russ Raschke, Entegris, Inc. (United States)
For over 40 years, the SPIE Advanced Lithography Symposium has played a key role in bringing together the microlithography communities involved with semiconductor devices, micro-/nano-systems, and related fields. Advances in traditional patterning together with the growth of alternative approaches drive the solutions of these demanding technologies. In the semiconductor field, the challenges of manufacturable, cost-effective lithography continue as patterning is extended further toward physical limits. State-of-the-art processes are being advanced through immersion lithography combined with multiple patterning and design co-optimization. Extreme UV lithography continues to move closer to volume production readiness, with a long string of successes along the way.
Entegris will present the following paper during the interactive poster session at SPIE on Tuesday, February 23rd:
An update on Entegris' EUV pellicle compatible EUV inner pod development
Authors: Huaping Wang, Russ Raschke, Entegris, Inc. (United States)