Join Us
Explore the latest advancements in contamination control at SPCC 2026 through both technical posters and a presentation from Entegris and industry collaborators.
This session features:
- Three technical posters focused on DIW filtration, nanoscale filter lifetime monitoring, and CFET wet clean defectivity reduction
- One presentation introducing a novel, image‑based method for characterizing nanoparticle filtration performance in weak acids
Attendees will gain practical insights into filtration behavior at advanced nodes, learn new analytical techniques, and engage directly with authors and presenters.
Poster Session
May 19th 6:30 pm – 8:00 pm
Challenges and Benefits of Using 2‑in‑1 Filtration Solutions for Contamination Control in Semiconductor DIW Applications
Ultrapure deionized water (DIW) is critical to semiconductor manufacturing, requiring effective control of both particulate and ionic contaminants at the point of use. Traditional approaches rely on separate particle filtration and purification steps, which are effective but often impractical due to space, cost, and flow limitations. This poster evaluates enhanced 2‑in‑1 filtration solutions that combine particle removal and purification within a single device. Performance is assessed through particle shedding, hard particle retention, and multi‑metal removal testing, with results compared to conventional particle‑only and purification‑only solutions.
Presenter: Juli Parab, Senior Engineer, Solutions Engineering
Does Pressure Drop Correlate with Filter Lifetime of Sub‑50 nm Filtration Solutions?
Pressure drop has historically been used to predict filter end of life, but its effectiveness for sub‑50 nm filtration remains unclear. This study investigates the relationship between pressure differential and retention performance in nanoscale PTFE membranes under continuous nanoparticle loading. Results show that contaminant breakthrough occurs well before any measurable increase in pressure drop across the filter. The findings highlight the risk of relying on pressure monitoring alone to determine filter lifetime for advanced, nanoscale filtration applications.
Presenter: Nicole Williams, Engineer, Solutions Engineering
Reducing CFET Wet Clean Process Defectivity with Advanced Liquid Filtration Solutions
As CFET architectures introduce vertically stacked transistors with multiple critical interfaces, contamination control becomes increasingly challenging. This work evaluates the impact of next‑generation liquid filtration solutions in a single‑wafer clean tool used for critical CFET wet clean processes. Advanced filtration performance was assessed using bare wafer defectivity analysis for particles >19 nm and in‑process SPC measurements. Results demonstrate reduced defectivity and improved process stability, highlighting the role of optimized filtration in enabling next‑generation CFET integration.
Presenter: Kusum Maharjan, Lead Engineer, Solutions Engineering
Presentations
May 20th 9:40 am – 10:00 am
Characterization of Particle Filtration Solutions in a Weak Acid
Nanoparticle contamination in semiconductor process chemicals originates from multiple sources and varies widely in size, morphology, and composition, making accurate filtration characterization challenging. This presentation introduces a substrate‑based, quasi‑continuous method that captures nanoparticles down to ~20 nm and enables SEM imaging combined with machine‑learning analysis to distinguish filter retention from shedding. The approach is applied to characterize membrane‑level filtration performance in a weak inorganic acid, evaluating the effects of pore size, membrane modification, cleaning process, and operating mode. Results demonstrate how optimized filtration strategies significantly improve overall particle removal efficiency and particle size distribution control.
Presenters:
Siddarth Sampath, Director, Global WEC Solution Engineering
Ashutosh Bhabhe, CEO, 14Si Solutions
Event Related Content
Targeted Filtration for H2O2 Contamination Control
Learn how contamination in 30% H₂O₂ originates and how targeted filtration strategies can help mitigate risk, based on insights shared at a previous SPCC. Read the blog to gain added context ahead of SPCC 2026.