Post-CMP Cleaners for Tungsten Advanced Nodes: 10nm and 7nm

By: Ruben Lieten, Daniela White, Thomas Parso, Michael White Entegris, Gmbh; Entegris, Inc

Poster Reception: Monday, Sept. 3rd from 5:30pm to 6:30pm

Location: Promotion Hall

Determination of HCl transport coefficients of real FOUPs polymers for HCl FOUP to wafer cross-contamination assessment

By: Minh-Phuong Tran, Hervé Fontaine, Carlos Beitia, Paola Gonzales-Aguirre, Jorgen Lungren, Sung-In Moon CEA TECH, France; Entegris.

Session 12: Contamination: Metrology and Control

Wednesday, Sept. 5th from 3:00pm to 3:40pm

Location: Promotion Hall