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The NT™ Proportional Control Valve, Model 6300 Cv ≤ 2.8 is developed for use in ultra high-purity applications. Compatible with highly corrosive processes and designed for use in CMP slurry applications.
Flow Factor
  • ≤ 2.8
Industry
  • Semiconductor
Process
  • Bulk Chemical Delivery
  • CMP
  • Photolithography
  • Wafer Growing
  • Wet Etch and Clean
The NT™ Proportional Control Valve, Model 6300 Cv 5.6 - 10 is developed for use in ultra high-purity applications. Compatible with highly corrosive processes and designed for use in CMP slurry applications.
Flow Factor
  • > 2.8
Industry
  • Semiconductor
Process
  • Bulk Chemical Delivery
  • CMP
  • Photolithography
  • Wafer Growing
  • Wet Etch and Clean
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