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Guardian™ DEV/HPM Filter
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Applications
- Industry: Semiconductor, Data Storage
- Process: Wet Etch and Clean
- Chemistry: Dilute Acids, Dilute Bases
- Installation Point: Point of Tool
Specifications
| Models: | Guardian DEV Cartridge, Guardian Plus HPM Cartridge, Guardian DEV HPX Disposable | |
| Materials: | Membrane: | Patented hydrophilic ultra-high molecular weight polyethylene (UPE) |
| Support, sleeve, core, end caps: | High-density polyethelene (HDPE) | |
| Code 0 Double 2-222 o-ring: | DEV; EP, E-FKM, Kalrez® 4079, Plus HPM; E-FKM, FER, DEV HPX; N/A | |
| Chem-Line™ disposable outer shell: | DEV; N/A, Plus HPM; N/A, DEV HPX; Polypropylene | |
| Rentention rating: | 0.05, 0.1 µm | |
| Membrane surface area: | DEV: | 0.85m², 20": 1.7m², 30": 2.55m² |
| Plus HPM: | 10"; 1.9m², 20"; 3.8m², 30"; 5.7m² | |
| DEV HPX: | 10"; 1.1. m², 20"; N/A, 30"; N/A | |
| Maximum operating conditions: | Maximum forward differential pressure: | DEV: 0.35 MPa (3.5 bar; 50 psid) @ 25°C (77°F) Plus HPM; 0.24 MPa (2.4 bar; 35 psid) @ 25°C (77°F) DEV HPX; 0.35 MPa (3.5 bar; 50 psid) @ 20°C (68°F) |
| Maximum reverse differential pressure: | DEV: 0.25 MPa (2.5 bar; 35 psid) @ 25°C (77°F) Plus HPM; 0.24 MPa (2.4 bar; 35 psid) @ 25°C (77°F) DEV HPX; 0.25 MPa (2.5 bar; 35 psid) @ 20°C (68°F) |
|
| Maximum inlet pressure: | DEV: N/A Plus HPM; 0.34 MPa (3.4 bar; 50 psid) @ 25°C (77°F) 0.34 MPa (3.4 bar; 50 psid) @ 25°C (77°F) DEV HPX: 0.69 MPa (6.9 bar; 100 psid) @ 20°C (68°F) |
|
| Maximum operating temperature: | 60°C (140°F) | |
| Compatibility: | Recommended for use in ammonium hydroxide, TMAH and low-temperature organic resist strippers. Not recommended in chemistries with peroxide or aromatic hydrocarbons. |
|
Successfully Opted for software Updates
Published Oct 30, 2018
Data Sheet
Guardian™ DEV and Guardian Plus HPM Cartridge and Disposable Filters
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