Liquid Filters
Showing 99 Products
Next generation, point-of-dispense, CMP slurry filters for large and fine particle reduction
Brand Name
- Planarcap®
- Slurry
- Point of Dispense
- Semiconductor
Best-in-class, point-of-dispense CMP slurry filter to prevent micro-scratches
Brand Name
- Planarcap®
- Slurry
- <10 nm
- 14-22 nm
- 28-90 nm
- >90 nm
- Point of Dispense
Next generation slurry filters for large and fine particle reduction
Brand Name
- Planargard®
- Slurry
- Bulk
- Semiconductor
Best-in-class, bulk CMP slurry filter for sub 45 nm technology nodes to prevent micro-scratches
Brand Name
- Planargard®
- Slurry
- <10 nm
- 14-22 nm
- 28-90 nm
- >90 nm
- Bulk
Utilizing patented, multilayer depth-type media, Solaris APR (advanced particle reduction) filters effectively reduce most large abrasive and slurry agglomerates in advanced node CMP processes.
Brand Name
- Solaris®
- Slurry
- Point of Tool
- Semiconductor
Allows easy installation or retrofit of Solaris® filtration technology in low-flow, point-of-use CMP applications.
Brand Name
- Solaris®
- Slurry
- Point of Tool
Best-in-class, bulk CMP slurry filter for sub 45 nm technology nodes to prevent micro-scratches
Brand Name
- Solaris®
- Slurry
- <10 nm
- 14-22 nm
- 28-90 nm
- >90 nm
- Point of Tool
Groundbreaking filtration media developed to improve critical photochemical performance in bulk chemical applications.
Brand Name
- Azora™
- Photoresist
- Solvent
- Photochemical
- Bulk
- Chemical Manufacturing
- Semiconductor
Best-in-class, ultra-clean, point-of-use photochemical filter, delivering superior flow rate performance and reduced microbubble formation capabilities.
Brand Name
- Impact®
- Photoresist
- Photochemical
- Solvent
- <10 nm
- 14-22 nm
- 28-90 nm
- Point of Tool
Designed for 5 nm and below, these filters are optimized for small contaminant retention in advanced photochemical applications
Brand Name
- Microgard™
- Photoresist
- Photochemical
- Solvent
- <5 nm
- Bulk
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