Optimizer® Lab Scale Filter
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- Industry: Semiconductor (R&D)
- Chemistry: Photoresist, Photochemicals, Solvents
- Installation Point: Lab Bench
Specifications
| C47 Housing and Membrane Disks: | |
|---|---|
| Membranes include: | Ultra-high molecular weight polyethylene (UPE) (hydrophobic) |
| PCM (hydrophilic) | |
| Protego® polyethylene ion exchange media | |
| Polypropylene media | |
| Membrane area: | 12 cm² |
| Housing materials: | Head, bowl, locking ring: High-density polyethylene |
| O-rings: EPDM or Perfluoroelastomer | |
| Bowl size: | 2-136 |
| Head size: | 2-223 |
| Hold-up volume: | 8.5 mL |
| Connections: | In/out/vent: 1/4" NPT |
| Maximum operating conditions: | Maximum operating pressure: Perfluoroelastomer O-ring: 0.21 MPa (2.1 bar, 30 PSI) at 25°C (77°F); EPDM O-ring: 0.28 MPa (2.8 bar, 40 PSI) at 25°C (77°F) |
| Maximum operating temperature: 40°C (104°F) | |
| Filter Attributes | Retention | |
| Optimizer® V-47 Filters | 0.1 µm , 10 nm, 0.05 µm, 30 nm, 20 nm | |
| Materials: | Membrane | UPE |
| Filtration area | 13.4 cm² (2.08 in²) | |
| Supports | PP nonwoven material | |
| Housing | PP | |
| Hold-up volume: | 1.5 mL | |
| Operating conditions: | Maximum operating pressure | 0.40 MPa (4.0 bar, 58 psi) @ 20ºC (68°F) |
| Maximum operating temperature | 60°C (140°F) | |
Successfully Opted for software Updates
| Part Number | Lithography Technology | Maximum Temperature | Membrane/Media | Form Factor | Pack | Retention Rating | Connection |
|---|---|---|---|---|---|---|---|
| CWAGC472C | KrF | 40°C (104°F) | UPE | Disc | 20 | 0.2 µm | 1/4" NPT inlet/outlet/vent |
| CWAGC4730 | KrF | 40°C (104°F) | UPE | Disc | 30 | 0.2 µm | 1/4" NPT inlet/outlet/vent |
| CWAVC472C | KrF | 40°C (104°F) | UPE | Disc | 20 | 0.1 µm | 1/4" NPT inlet/outlet/vent |
| CWAVC4730 | KrF | 40°C (104°F) | UPE | Disc | 30 | 0.1 µm | 1/4" NPT inlet/outlet/vent |
| CWAXC472C | ArF | 40°C (104°F) | UPE | Disc | 20 | 20 nm | 1/4" NPT inlet/outlet/vent |
| CWAXC4730 | ArF | 40°C (104°F) | UPE | Disc | 30 | 20 nm | 1/4" NPT inlet/outlet/vent |
| CWAZC472C | KrF | 40°C (104°F) | UPE | Disc | 20 | 0.05 µm | 1/4" NPT inlet/outlet/vent |
| CWAZC4730 | KrF | 40°C (104°F) | UPE | Disc | 30 | 0.05 µm | 1/4" NPT inlet/outlet/vent |
| CWUAC472C | KrF | 40°C (104°F) | UPE | Disc | 20 | 1 µm | 1/4" NPT inlet/outlet/vent |
| CWUAC4730 | KrF | 40°C (104°F) | UPE | Disc | 30 | 1 µm | 1/4" NPT inlet/outlet/vent |
| CWUHC472C | KrF | 40°C (104°F) | UPE | Disc | 20 | 0.5 µm | 1/4" NPT inlet/outlet/vent |
| CWUHC4730 | KrF | 40°C (104°F) | UPE | Disc | 30 | 0.5 µm | 1/4" NPT inlet/outlet/vent |
| FD5AT1R12 | Immersion | 60°C (140°F) | UPE | Syringe | 12 | 10 nm | 1/8" MNPT inlet/outlet |
| FD5ATFR12 | Immersion | 60°C (140°F) | UPE | Syringe | 12 | 10 nm | Female Luer-Lok™ inlet: 1/4" stepped barb outlet |
| FD5AV1R12 | KrF | 60°C (140°F) | UPE | Syringe | 12 | 0.1 µm | 1/8" MNPT inlet/outlet |
| FD5AVFR12 | KrF | 60°C (140°F) | UPE | Syringe | 12 | 0.1 µm | Female Luer-Lok™ inlet: 1/4" stepped barb outlet |
| FD5AX1R12 | ArF | 60°C (140°F) | UPE | Syringe | 12 | 20 nm | 1/8" MNPT inlet/outlet |
| FD5AXFR12 | ArF | 60°C (140°F) | UPE | Syringe | 12 | 20 nm | Female Luer-Lok™ inlet: 1/4" stepped barb outlet |
| FD5AY1R12 | ArF | 60°C (140°F) | UPE | Syringe | 12 | 30 nm | 1/8" MNPT inlet/outlet |
| FD5AYFR12 | ArF | 60°C (140°F) | UPE | Syringe | 12 | 30 nm | Female Luer-Lok™ inlet: 1/4" stepped barb outlet |
| FD5AZ1R12 | KrF | 60°C (140°F) | UPE | Syringe | 12 | 0.05 µm | 1/8" MNPT inlet/outlet |
| FD5AZFR12 | KrF | 60°C (140°F) | UPE | Syringe | 12 | 0.05 µm | Female Luer-Lok™ inlet: 1/4" stepped barb outlet |
| FD5MX1R12 | ArF | 60°C (140°F) | UPE PCM | Syringe | 12 | 20 nm | 1/8" MNPT inlet/outlet |
| FD5MXFR12 | ArF | 60°C (140°F) | UPE | Syringe | 12 | 20 nm | Female Luer-Lok™ inlet: 1/4" stepped barb outlet |
| FD5TZ1R12 | KrF | 60°C (140°F) | PTFE | Syringe | 12 | 0.05 µm | 1/8" MNPT inlet/outlet |