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Purasol™ SP/SN Solvent Purifiers
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Reference Materials
Applications
- Photolithography solvents
- Raw materials (resin, polymer solutions, etc.) used in photochemical manufacturing
Specifications
Materials | Purification media | Modified Ultra High Molecular Weight Polyethylene (UPE) | ||
Shell, core, supports | High Density Polyethylene (HDPE) | |||
Device connection type | E-FKM O-ring (cartridge) ¼“ compression seal | |||
Maximum inlet pressure | 0.39 Mpa (3.9 bar, 56 psi) @ 25°C (77°F) | |||
Membrane area | 0.17 m2 (disposable) 1.1 m2 (10'' cartridge); 2.2 m2 (20'' cartridge) | |||
Maximum operating conditions | Maximum inlet pressure | 0.34 MPa (3.4 bar, 50 psi) @ 25° (77°F) | ||
Maximum forward/reverse differential pressure | 0.24 MPa (2.4 bar, 35 psi) @ 25° (77°F) | |||
Maximum operating temperature | 60°C (140°F) | |||
Compatibility | Most organic solvents used in semiconductor manufacturing including ketone solvents such as cyclohexanone | |||
Removal rating | 0.2 µm nominal | |||
Typical flow rate | Purasol SP 20' cartridge filter': Purasol SN 20' cartridge filter': | 27 L/min @ 20 kPa; 26 L/min @ 20 kPa; | Purasol SP disposable filter: Purasol SN disposable filter: | 4 L/min @ 60 kPa 3.6 L/min @ 60 kPa |
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