Ultrapure Silicon Coating
- Optical mirrors for air, space and terrestrial applications
- Ion implant
- Wafer bonding
- Plasma nitriding applications
Specifications
| Substrate: | Compatibility: Metals, ceramics (AIN, AI2O3, quartz, PSZ, graphite, etc.), and polymers |
| Size: up to 91 cm (36”) | |
| Geometry: Any shape, including complex geometries | |
| Structure: | Amorphous; contains hydrogen |
| Temperature: | Deposition: Below 150°C (302°F) |
| Use: -50°C to 600°C (-58°F to 1112°F) | |
| Coating thickness: | A few nm to over 150 μm |
| Electrical resistivity: | 5 x 108 Ω-cm, lower values possible |
| Hardness: | 600 DPHN |
| Purity: | 99.9995% |
| Wear resistance: | Good |
| Corrosion resistance: | Excellent resistance in aqueous, acidic and alkaline environments |
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