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Plasma Enhanced Chemical Vapor Deposition (PECVD) Coatings

Amorphous, dense and conformal coatings deposited at low temperature

We specialize in silicon and carbon-based coatings using PECVD processes. Highly compatible to fit your business, deposit coatings can be used on a variety of vacuum compatible substrates including metals, alloys, ceramics, semiconductors and polymers. We can coat chambers that can accommodate different shapes and sized items, up to 31" in diameter.

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Caerus™ Coating Technology

Caerus™ family of Aluminum-based Oxide coatings are deposited at low temperatures with superior film quality. Our Caerus coatings are highly conformal, dense, pinhole-free and exhibit homogeneous microstructure. The coatings have excellent adhesion and provide outstanding corrosion and etch resistance properties. They are also characterized by superb electrical voltage stand-off and exceptional trace metal diffusion barrier layer characteristics. 
Pegasus™ Coating Technology

Pegasus™ series coatings are a family of precision-engineered PVD coatings tailored for Fluorine and Chlorine plasma etch applications. Our Pegasus coatings are deposited at low temperatures and can be deposited on aluminum, alumina, stainless steel and other commonly used substrate materials, with superior adhesion. These coatings provide etch resistance, low particle generation, and oxidation resistance.  
Chucks

Our chuck solutions use innovative coating technologies which make for a very flat surface that prevents metal contamination, reduces particles and is durable to last millions of wafer cycles.
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