Join Us
Thursday, June 29 | 9:30 AM – 4:00 PM
We are honored to welcome the research center CEA-Leti, and the foundry Lfoundry, to add their voice to the CMP Technology Day agenda. You will also learn how optimized end-to-end solutions from Entegris can help you:
- Accelerate time to yield
- Lower your cost of ownership
- Improve your process
Featured Program
| 09:30 | Registration & Welcome Coffee |
| 10:00 |
Entegris Today - A New Collaborative Approach Antoine Amade - President EMA Region |
| 10:15 |
Accelerated Time to Yield with Entegris End-to-End CMP Solutions Ankur Desai – Strategic Accounts Director for Intel and Sales Director for VCS North America/EMEA |
| 10:25 |
LFoundry and Entegris: A Success Story of Collaboration Girolamo Penso – CMP Process Manager at LFoundry |
| 10:55 | Break |
| 11:10 |
See the Positive Difference of the New D92XX Slurry Line Federico Barbieri – Sr. Customer Technology Engineer EMEA for CMP |
| 11:35 |
Time to Change Your CMP Pad? Discover the Benefits of a Different Technology Mario Stella – Sr CTE Manager EMEA |
| 12:00 | Networking Lunch sponsored by Entegris |
| 13:30 | Enabling 2.5D/3D IC Heterogeneous Integration and More than Moore Chiplet Scaling with Through-Silicon via, Hybrid Bonding Copper, and Die-Isolation Dielectrics CMP Solutions Jim Hsu - Director of CMP Technologies |
| 14:05 |
Real-Time Concentration Measurements for Efficient Process Control Philipp Lehmann – Field Applications Engineer EMEA |
| 14:25 |
Joining Forces in R&D – An Introduction to Our Collaboration Efforts to Improve Defectivity in CMP Clément Castan – R&D Chemical-Mechanical Planarization Engineer at CEA-Leti |
| 14:25 | Break |
| 15:35 |
Enhance Your Process by Advanced Slurry Filtration Günter Haas, Ph.D. – Field Application Engineer | Liquid Microcontamination Control |
| 15:35 |
Complete Slurry Lifecycle LPCs Monitoring and Control with Accusizer® Lab and Online Tools Cyril Tô – Sr. Account Manager | Instrumentation |
| 15:55 | Wrap-up |
Industry Insights
Synergies to Improve CMP Yield
This animation explains how, with help from complementary Entegris technologies, fabs can continuously monitor CMP slurry - from blending
through point of use - and greatly reduce yield loss and achieve CMP mastery. Runtime: 01:41
Chemical Mechanical Planarization
Finding synergies between the slurries, components, filters, chemistries, conditioners, brushes, and monitoring tools used in CMP, and sourcing them from Entegris, can improve wafer performance, yield, and variability.
Featured Brochure
BrochureComprehensive listing of our holistic CMP process solutions that reduce contamination and deliver the best on-wafer performance, decrease cost of ownership, and ensure high yield.