ECSCRM is a scientific event where experts explore, present, and discuss the new achievements in the field of wide-bandgap semiconductors focusing on silicon carbide (SiC) and other wide bandgap semiconductors.
The topics covered in the ECSCRM include fundamentals (theoretical and experimental), bulk and epitaxial growth, new materials grown on SiC, material characterization, surfaces and interfaces, device fabrication processes, devices and device physics, packaging, applications, reliability, and power related materials.
ECSCRM is a scientific event where experts explore, present, and discuss the new achievements in the field of wide-bandgap semiconductors focusing on silicon carbide (SiC) and other wide bandgap semiconductors.
The topics covered in the ECSCRM include fundamentals (theoretical and experimental), bulk and epitaxial growth, new materials grown on SiC, material characterization, surfaces and interfaces, device fabrication processes, devices and device physics, packaging, applications, reliability, and power related materials.
/content/entegris-live/en/home/about-us/events/ecscrm-2021Join Us | Booth #31
Please visit booth #31 to learn more about our material suite and unique process that yields high purity SiC, in alignment with our mission of contamination control.
Our experts will also be there to talk to you about the design and production of our Chemical Mechanical Planarization (CMP) slurries used for polishing ultra-hard surface materials, including SiC and gallium nitride (GaN).
Our slurry technology, along with our broad capabilities in CMP cleans, filtration, and applications technology, enable new solutions for CMP customers.
Featured Content
At Entegris we understand the challenges specific to CMP of SiC wafers and have solutions to improve SiC slurry performance and meet the needs of power IC manufacturers.
Our line of high-purity silicon carbide products are marketed under the SUPERSiC® trade name. SUPERSiC is a unique silicon carbide material created and customized precisely for specific applications. We provide a wide array of infiltration materials, cleaning options and coatings to create the material specifications that meet your precise needs.
Featured Product Solutions
Our scalable portfolio includes high performance slurries that reduce COO and maintain low defectivity
We are a market leader in the design and production of CMP slurries for polishing ultra-hard surface materials such as SiC (silicon carbide), sapphire, GaN (gallium nitride), and diamond (lapped or mechanically polished) into epi-ready condition.
SUPERSiC® is the base converted silicon carbide. This material is ideal for high-temperature and atmospheric processes and harsh process environments.