- Dr. Daniela White | Senior Principal Scientist - Entegris
- Henry Wang Ph.D. | R&D Manager – CMP Engineering, Microcontamination Control - Entegris
- Chloe Chen | Applications Engineer, Microcontamination Control - Entegris
Register to Join Us!
Entegris is pleased to be a platinum sponsor and presenter at ICPT 2022 to introduce new solutions across the CMP application. With the recent acquisition of CMC Materials, Entegris is in a unique position to offer single source solutions and eliminate the introduction of unnecessary contamination risk from incompatible chemicals or consumables. As today’s leading-edge chip designs become tomorrow’s mainstream products, single sourcing offers tremendous benefit to all fabs.
Featured Virtual Presentation
Understanding Molybdenum Films - Challenges for Molybdenum Post CMP Cleaning Formulations
Wednesday, September 28 | 8:30 AM
Presented by Dr. Daniela White, senior principal scientist, Entegris
At the conference, Dr. Daniela White will present virtually on challenges in Mo/SiO2/Si3N4 post CMP cleaning, the characterization of Mo CMP byproducts with TiO2-based slurry abrasives, and the characterization of Mo CMP byproducts with SiO2-based slurry abrasives.
Dr. White has 22 years of R&D experience in a variety of synthesis/characterization techniques of novel intermediates and products, formulation and application processes, and a track-record of over 50 technical publications in peer-reviewed journals and over 70 US and WO patents. Dr. White graduated with both BS and PhD degrees in Chemical Engineering from the Bucharest Polytechnic Institute, Romania, followed by two post-doctoral research fellowships at Carnegie Mellon University, Pittsburgh, PA and Rensselaer Polytechnic Institute, Troy, NY.
P22 - 4:45 PM September 27 (Tuesday)
Methodology Between Theoretical Modeling and Experimental Trials for Depth Filter Media of Micro/Nano Particles in Slurry
Presented by: Henry Wang Ph.D., R&D manager – CMP Engineering, Microcontamination Control - Entegris
P48 - 4:45PM September 28 (Wednesday)
Novel CMP Filtration Technology Application for Critical Size Particle Removal
Presented by: Chloe Chen, applications engineer, Microcontamination Control - Entegris
Chemical Mechanical Planarization
Finding synergies between the slurries, components, filters, chemistries, conditioners, brushes, and monitoring tools used in CMP, and sourcing them from Entegris, can improve wafer performance, yield, and variability.