Ultrapure Micro is the premier annual conference driving semiconductor manufacturing forward through collaboration and knowledge exchange.
Register to join us for this virtual event and to attend scheduled presentations.
Join us for the following presentations:
Event-related Resources
We invite you to learn more about Entegris solutions for advanced filtration and contamination control through the following resources:
As logic devices go to smaller line widths, 3D NAND architectures increase layers, and DRAM memory density increases, sensitivity to contamination and defects have a greater impact on device performance. To achieve optimum wafer yield and reliability, the microelectronics industry needs to address the increased materials consumption requirements and material purity challenges from chemical manufacture to point of use.
To enable the effective manufacturing of electronic devices for the Fourth Industrial Revolution, fabs (integrated circuit manufacturers) are challenged with producing denser and more complex chips with smaller line spacing and 3D features. The digital transformation we are all experiencing as consumers presents new challenges to material makers, as well as opportunities. Contamination control remains one of the largest challenge as integrated circuit (IC) technology advances.
Semiconductor device yields have long been impacted by contamination. As process nodes continue to shrink to 5 nm and features become more complex — pushing the manufacturing challenges of chip designs to new limits — the sensitivity to contamination during manufacturing processes has increased significantly.