High Purity Chemical Manufacturing
To enable the effective manufacturing of electronic devices for the Fourth Industrial Revolution, fabs (integrated circuit manufacturers) are challenged with producing denser and more complex chips with smaller line spacing and 3D features. The digital transformation we are all experiencing as consumers presents new challenges to material makers, as well as opportunities. Contamination control remains one of the largest challenge as integrated circuit (IC) technology advances. Better contamination control can significantly improve yield, and a one percent yield improvement can mean up to $150 million per year in net profit for the fab. As a supplier to these fabs, the opportunities to enable these improvements exist in part within the purity of the materials.
Technical Paper
Performance Targets: Achieving Operational Excellence in Chemical Manufacturing by Optimizing Contamination Controls
Operational excellence (OE) is of upmost importance when manufacturing high-quality, semiconductor grade chemicals and their raw materials. Streamlining and expanding operations, improving quality, and maintaining differentiation are all key activities toward achieving OE. However, all these activities come at a cost, whether it be a financial impact or an impact on other opportunities. Filtration and purification of raw materials and chemicals can improve quality by reducing metals and particles, decreasing variability, and perhaps streamlining manufacturing processes.
White Paper
The Fight for Purity in Chemical Manufacturing
The digital transformation we are all experiencing as consumers present new challenges to material makers, as well as opportunities. Contamination control remains one of the largest challenges as integrated circuit (IC) technology advances. Better contamination control can significantly improve yield, and a one percent yield improvement can mean up to $150 million per year in net profit.
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Pure Solutions
Entegris’ microcontamination control creates custom processes for eliminating impurities in semiconductor manufacturing.
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As logic devices go to smaller line widths, 3D NAND architectures increase layers, and DRAM memory density increases, sensitivity to contamination and defects have a greater impact on device performance. To achieve optimum wafer yield and reliability, the microelectronics industry needs to address the increased materials consumption requirements and material purity challenges from chemical manufacture to point of use.
As automotive electronics become more complex and prevalent, the cost of failure in these devices rises. Hidden defects caused by small particles, gels, metal ions, and organic contaminants can lead to failures throughout the vehicle’s life, escalating costs and increasing risk. How can you prevent hidden defects? Use Entegris advanced chemical filtration and purification solutions in the semiconductor fab.
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These high-performance filters reliably control defect-causing contaminants in solvent and dilute acid and base applications. High-porosity, hydrophilic and hydrophobic PTFE membranes enables high flow rate and reduce operational costs in a variety of standard sizes and configurations.
Enables high flow rate and retention performance. Ultraclean technology effectively reduces metals, chlorides, and particle shedding to lower organic extractables to maximize wafer yield.
QuickChange filters provide advanced filtration of aqueous, outgassing, and aggressive acid and base chemistries in 28 nm or greater technology nodes. Enhanced cleaning technology effectively reduces metals, chlorides, and particle shedding to lower organic extractables to maximize wafer yield.
Purasol solvent purifiers are the best-in-class solutions for ultraclean chemical and raw material manufacturers. Using uniquely tailored membrane technology, the versatile purifier can efficiently remove both dissolved and colloidal metal contaminants from a wide variety of ultrapure, polar and non-polar solvents including difficult to remove ketones like cyclohexanone.
Best-in-class, clean, bulk photochemical filter, providing superior flow rate performance and excellent contaminant retention capabilities in sub 10 nm technology nodes.
Best-in-class, point-of-dispense slurry filter with ultra-high particle loading capacity in sub 45 nm technology nodes to prevent microscratches. Offers superior hard particle removal and gel retention performance at the point of dispense, reducing costly wafer defects.