BILLERICA, Mass., July 7, 2011 – Entegris, Inc. (NASDAQ: ENTG) will showcase its latest solutions for photovoltaic manufacturers at the 2011 Intersolar North America event being held at the Moscone Center in San Francisco on July 12 through July 14. Entegris' expertise in the handling and control of wet chemistries, gas processes, and critical substrates offer photovoltaic manufacturers the optimal material handling and contamination control needed to achieve target cell efficiencies. The companyís solutions help increase efficiency and productivity in both thin film process and silicon-based photovoltaic manufacturing.
Among the products Entegris will feature at Intersolar North America are:
Entegris' POCO® graphite and silicon carbide components, including both standard size and long, horizontal carriers for use in high-temperature thermal processes. These components can eliminate particle shedding and enable controlled thermal conditions and reduced thermal budget in challenging deposition conditions.
Savana® liquid filters for removing defect-causing particles and agglomerates before they reach the wafer or substrate surface. The latest generation of Savana filters is optimized for less aggressive acid or base applications with high particle loads that are specific to thin film wet processes. For other aggressive chemistries, Entegris offers a full range of filtration solutions that offer superior chemical resistance and retention.
Substrate shippers and carriers for shipping and transport wafers and critical substrates. Constructed from cleanable polypropylene materials, Entegris' Multifunction shippers designed specifically for photovoltaic usage offer increased protection, higher shipment density, and reuse and recycling capabilities.
To see these and other Entegris products at Intersolar North America, please visit booth #5723 in the North Hall at Moscone West, or contact your local Entegris representative. For more information, follow Entegris on Twitter.