GHENT, Belgium, September 17, 2012 – Entegris, Inc. presented a novel approach to measuring the retention of particles smaller than 10 nanometers in advanced filtration applications at the 11th International Symposium on Ultra Clean Processing of Semiconductor Surfaces(UCPSS) held in Ghent, Belgium, on September 16 – 19, 2012. The approach developed by Entegris applies CdSe fluorescent quantum dots technology to precisely measure the retention for certain filtration devices.
Advances in semiconductor materials and processes needed to manufacture next-generation devices require the use of new filter membranes that can remove particle contaminants smaller than 10 nanometers in size (1 nanometer is equivalent to 1 billionth of a meter). One key parameter of membrane performance is pore size, which is usually expressed as average pore diameter. However, measuring filter pore size can be problematic as there are no accurate metrology tools today that can measure particles that size.
Using quantum dots, which are tiny nanocrystals that emit different colored florescent light depending on the size of the quantum dot, Entegris engineers have demonstrated a new method for accurately measuring the retention characteristics of 3 nanometer, 5 nanometer and 10 nanometer UPE (ultra-high molecular weight polyethylene) membranes.
Entegris is also planning to present a technical paper on the application of quantum dot technology in photolithography filtration applications at the SPIE Advanced Lithography conference scheduled for February 2013 in San Jose, California.
Entegris provides a wide range of products for purifying, protecting and transporting critical materials used in processing and manufacturing in semiconductor and other high-tech industries. Entegris is ISO 9001 certified and has manufacturing, customer service or research facilities in the United States, China, France, Germany, Israel, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information can be found at www.entegris.com.