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Post Etch Cleaning Solutions

Industry leading solutions for post etch processing needs.

Complete range of solutions for the post etch residue and hard mask removal process steps. Solutions offer excellent corrosion control, surface contamination removal and cost of operation performance.

Featured White Paper

CMP Slurry: Considerations for Liquid Flow Control Technologies

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Featured White Paper

CMP Slurry: Considerations for Liquid Flow Control Technologies

Download Now

Featured White Paper

CMP Slurry: Considerations for Liquid Flow Control Technologies

Download Now

TitanKlean® Cleaning Solutions

The TitanKlean® family of solutions covers all application needs from hard mask preservation to partial removal and full removal, and offers solutions compatible with all advanced metalization schemes. Initially designed to meet the Post Etch Residue and Hard Mask Removal requirements in Advanced Logic, the application space is expanding in to advanced memory applications.

ST Cleaning Solutions

Solvent based Positive resist strippers designed to effectively remove hard-to-strip positive photoresists from corrosion-sensitive substrates.

NOE Etchant Cleaning Solutions

Entegris' etchant blend has been designed to remove deposited residual oxides resulting in a substantial increase in device yield.