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Glossary

Detailed explanations of key technologies and principles of our particle characterization analyzers, used for solving a wide range of laboratory and liquid process applications in semiconductor, life sciences, and other industries.
Automated Static Image Analysis

Avalanche Photodiodes (APDs)

Dispersion

EUV Dry Resist Precursors

EUV dry resist technology offers an innovative approach toward addressing critical high-volume manufacturing challenges of advanced logic and DRAM products, including resolution, productivity, and stochastic defectivity.
Dynamic Light Scattering (DLS) - DLS - Photon Correlation Spectroscopy (PCS) - Dynamic Light Scattering

Dynamic Liquid Image Analysis

Frequency

Laser Diffraction

Light Obscuration

Oversized Particles

Process Analytical Technology (PAT)

Two Stage Dilusion

Unstable - Ostwald Ripening

USP Chapter <788>

Zeta Potential