Advanced Post Etch Residue and Hard Mask Removal Solutions
The TitanKlean® family of solutions covers all application needs from hard mask preservation to partial removal and full removal, and offers solutions compatible with all advanced metalization schemes. Initially designed to meet the Post Etch Residue and Hard Mask Removal requirements in Advanced Logic, the application space is expanding in to advanced memory applications.
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Considerations for Improving 3D NAND Performance, Reliability, and Yield