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50 Years Strong!

Feb. 4, 2017

Corporate Fact Sheet
Narrow Your Selection
  • Industry
  • Process
  • CAS #
  • Chemical Formula
  • Element
4MS
UltraPur™ 4MS is a precursor used in the chemical vapor deposition of low-k inter-metal dielectric films for sub-0.25µm IC interconnects.
Industry
  • Semiconductor
Process
  • Deposition
CAS #
  • 75-76-3
Chemical Formula
  • Si(CH3)4
HCDS HP is a liquid precursor used in CVD, ALD and LPCVD SiN and SSPD processes
Industry
  • Semiconductor
Process
  • Deposition
CAS #
  • 13465-77-5
Chemical Formula
  • Cl6Si2
UltraPur™ TDMAT is a precursor used in CVD and ALD processes
Industry
  • Semiconductor
  • Flat Planel Display
Process
  • Deposition
CAS #
  • 3275-24-9
Chemical Formula
  • C8H24N4Ti
UltraPur™ HfCl4 is a precursor used in the ALD process
Industry
  • Semiconductor
Process
  • Deposition
CAS #
  • 13499-05-3
Chemical Formula
  • HfCl4
UltraPur™ TEB is an organic boron ester compound widely used as a boron source in the deposition of doped silicate glass in a low pressure and plasma-enhanced CVD process.
Industry
  • Semiconductor
Process
  • Deposition
CAS #
  • 273723-18-5
Chemical Formula
  • C6H15BO3
TEB
UltraPur™ TEB is a precursor used in CVD process.
Industry
  • Semiconductor
Process
  • Deposition
CAS #
  • 150-46-9
Chemical Formula
  • C6H15BO3
UltraPur™ TEOS is a liquid precursor used in CVD process
Industry
  • Semiconductor
Process
  • Deposition
CAS #
  • 78-10-4
Chemical Formula
  • SiC8H20O4
TMB
Ultrapur™ TMB is a precursor used in deposition of doped silicate glass in low pressure, plasma-enhanced CVD process.
Industry
  • Semiconductor
Process
  • Deposition
CAS #
  • 121-43-7
Chemical Formula
  • C3H9BO3
UltraPur™ TEPO is a liquid precursor used in the deposition of doped silicate glass.
Industry
  • Semiconductor
Process
  • Deposition
CAS #
  • 78-40-0
Chemical Formula
  • C6H15O4P
TMP
UltraPur™ TMP is a precursor used in deposition of doped silicate glass.
Industry
  • Semiconductor
Process
  • Deposition
CAS #
  • 121-45-9
Chemical Formula
  • C3H9O3P
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