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Nitride Slurries

High performance slurries for scalable manufacturing of atomically smooth and defect-free nitride surfaces

  • Innovative solutions for bulk polishing, lapping, and CMP for multiple nitride surfaces (GaN, AlGaN, AlN, Ga- or N-face, 'c' or 'm' planes)
  • Industry-leading CMP slurries optimized to achieve low surface roughness (<2 angstrom) and low defectivity
  • Advanced formulations that provide ultra-high polishing rates up to 10 times higher than existing bulk removal processes, while maintaining uniformity, zero sub-surface damage, and low defectivity/scratches
  • Read More Read Less
Interested in Nitride Slurries?

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