These PS9 catalyst and adsorber bulk gas purifiers efficiently remove numerous impurities with high reliability, low cost, and high performance.
Uses dual catalytic and adsorption processes designed specifically to provide ultra-high purity gas for semiconductor applications
Hydrocarbons (CH4), carbon monoxide (CO), and hydrogen (H2) react at elevated temperatures with oxygen (O2) or extreme clean dry air (XCDA®) in the oxidizing catalyst vessel to form carbon dioxide (CO2) and water (H2O), which, along with O2 are then removed in the ambient temperature adsorber vessel.
Two adsorber vessels alternate between purify and regeneration modes, providing continuous purification
Adsorber regeneration is accomplished by back flushing with a mixture of purified process gas and low concentration H2 at an elevated temperature
Optimized design provides sub-ppb performance in small footprints with flow rates up to 200,000 slpm (12,000 Nm3/hr)
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