Microgard™ Plus/Plus LE/LE Nylon Filter
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Applications
- Industry: Semiconductor, Chemical Manufacturing, Data Storage
- Process: Photolithography, Facilities, Wet Etch and Clean, Media
- Lube, Chemical Manufacturing
- Chemistry: Photoresist, Photochemicals, Solvents
- Installation Point: Bulk
Specifications
| Plus/Plus LE | LE Nylon | ||
|---|---|---|---|
| Materials | Membrane | Hydrophobic UPE | Polyamide (nylon 6) |
| Membrane area | 4" UPX: 10 nm: 9200 cm² (9.9 ft²) Others: 8000 cm² (8.6 ft²) |
||
| 10" 10 nm: 13,200 cm² (14.21 ft²) 20 nm: 12,000 cm² (12.9 ft²) Others: 8000 cm² (8.6 ft²) |
10": 7000 cm² (7.5 ft²) | ||
| 20" 20 nm: 24,000 cm² (25.8 ft²) Others: 20,000 cm² (21.5 ft²) |
20": 14,000 cm² (15.1 ft²) | ||
| 30" 30,000 cm² (32.3 ft²) | |||
| 10" asym 11,600 cm² (12.5 ft²) | |||
| 20" asym 23,200 cm² (25 ft²) | |||
| Supports, core sleeve | HDPE | HDPE | |
| O-ring | EPDM and E-FKM | E-FKM | |
| Retention rating | 3, 5, 10 nm | 10, 20 nm | |
| Operating conditions | Maximum forward differential pressure: | 0.34 MPa (3.4 bar, 50 psid, 3.5 kg/cm²) @ 20°C (68°F) | 0.28 MPa (2.8 bar, 41 psid, 2.9 kg/cm²) @ 20°C (68°F) |
| Maximum reverse differential pressure: | 0.24 MPa (2.4 bar, 35 psid, 2.5 kg/cm²) @ 20°C (68°F) | 0.21 MPa (2.1 bar, 31 psid, 2.2 kg/cm²) @ 20°C (68°F) | |
| Operating temperature | 60°C (140°F) | 50°C (122°F) |
| LE Nylon | |||
|---|---|---|---|
| Materials | Membrane | Polyamide | |
| Supports, core sleeve | HDPE | ||
| Chemlock key | PFA | ||
| O-ring | E-FKM | ||
| Filter type | Asymmetric | ||
| Membrane area | 10 nm, 20 nm, 0.05 µm (70 mm) | ||
| 10": 0.71 m² | |||
| 20": 1.42 m² | |||
| 30": 2.13 m² | |||
| 10 nm, 20 nm (83 mm) | |||
| 10" 1.31 m² | |||
| Retention rating | 10 nm, 20 nm, 0.05 µm | ||
| Operating conditions | Maximum forward differential pressure: | 0.28 MPa @ 25°C (77°F) | |
| Maximum reverse differential pressure: | 0.21 MPa @ 25°C (77°F) | ||
| Operating temperature | 60°C (140°F) | ||
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