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Microgard™ UC Filter

Best-in-class, clean, bulk photochemical filter, providing superior flow rate performance and excellent contaminant retention capabilities in sub 10 nm technology nodes.

Delivers contamination control in bulk photochemical manufacturing and solvent-based photolithography applications
Advanced device design enables higher chemical throughput and flow rate performance
Available in ultraclean or standard clean versions which reduce particle shedding and metal and organic extractables in sub-28 nm nodes
A higher throughput (HT) design is available for select 10" and 20" filter types

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Typical Flow Rate

Length

Retention Rating

Connection

Diameter

O-ring

Chemlock® Key

Filter Cleaning

Prewet

Part Number:

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CAD CAD Files

CAD drawings may be available for this product. Please use the Part Selector to select a part number to see if they are available.

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Applications Microgard™ UC Filter Applications

Bulk solvent chemical filtration
Bulk photochemical filtration
Chemical distribution systems

Specifications

Drawings

Performance Data

Product Specifications

Materials	Membrane		Asymmetric UPE*
			Clean Material Resin
	Sleeve, core, supports		High density polyethylene (HDPE)
	O-ring		E-FKM (AS568-222)
			Retention Ratings
			Standard clean	Ultraclean
Membrane area (based on diameter)	4"	83 mm: 0.9 m² (9.7 ft²)	3 nm	__
	10"	70 mm: 1.31 m² (14.1 ft²)	3, 5, 10 nm	3, 5 nm
		83 mm: 1.85 m² (19.9 ft²)	10 nm	__
	10" HT**	70 mm 1.77 m² (19.1 ft²)	3, 5 nm	3 nm
		83 mm: 2.61 m² (28.1 ft²)	5 nm	__
	20"	70 mm: 2.62 m² (28.2 ft²)	3, 5, 10 nm	3, 5 nm
		83 mm: 3.71 m² (39.9 ft²)	3, 5, 10 nm	3, 5 nm
	20" HT**	70 mm: 3.55 m² (36.2 ft²)	3, 5 nm	3 nm
		83 mm: 5.22 m² (56.2 ft²)	__	3 nm
	30"	70 mm: 3.94 m² (42.4 ft²)	3, 10 nm	__
		83 mm: 5.63 m² (60.6 ft²)	10 nm	__
Operating conditions	Maximum inlet pressure		0.34 MPa (3.4 bar, 50 psi) @ 25°C (77°F)
	Maximum forward/reverse differential pressure		0.24 MPa (2.4 bar, 35 psi) @ 25°C (77°F)
	Maximum operating temperature		60°C (140°F)
Metallic extractables	Testing conducted for Standard clean: 13 metals		Testing conducted for Ultraclean: 23 metals

*UHMWPE - long-form acronym for UPE - Ultra-high moelcular weight polyethylene.
**The high-throughput device design is incorporated into select 10" and 20" units, excluding those with a 10 nm retention rating.

Successfully Opted for software Updates

Reference Materials Product Documentation

Published Apr 17, 2017 Data Sheet Microgard™ Bulk Photochemical Filters

659.1 kB

Published Aug 20, 2019 Data Sheet Microgard™ C/UC/UCP Photochemical Filters

402.0 kB

Published Jul 1, 2021 Brochure Liquid Filtration Solutions

2.1 MB

Part Numbers

Microgard™ UC Filter Part Numbers

Part Number	Typical Flow Rate	Length	Retention Rating	Connection	Diameter	O-ring	Chemlock® Key	Filter Cleaning	Prewet
CWCF01MST	Standard flux	10"	5 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWCF01MSTUC	Standard flux	10"	5 nm	Code 0	70 mm	E-FKM	No	Ultraclean (UC)	No
CWCF02MST	Standard flux	20"	5 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWCF02MSTK	Standard flux	20"	5 nm	Code 0	70 mm	E-FKM	Yes	Standard	No
CWCF02MSTUC	Standard flux	20"	5 nm	Code 0	70 mm	E-FKM	No	Ultraclean (UC)	No
CWCF02XST	Standard flux	20"	5 nm	Code 0	83 mm	E-FKM	No	Standard	No
CWCF02XSTUC	Standard flux	20"	5 nm	Code 0	83 mm	E-FKM	No	Ultraclean (UC)	No
CWCF52MST	Standard flux	20"	5 nm	Code 5	70 mm	E-FKM	No	Standard	No
CWCK01MST	Standard flux	10"	3 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWCK01MSTAQ	Standard flux	10"	3 nm	Code 0	70 mm	E-FKM	No	Ultraclean (UC)	Yes
CWCK01MSTUC	Standard flux	10"	3 nm	Code 0	70 mm	E-FKM	No	Ultraclean (UC)	No
CWCK02MST	Standard flux	20"	3 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWCK02MSTAQ	Standard flux	20"	20 nm	Code 0	70 mm	E-FKM	No	Ultraclean (UC)	Yes
CWCK02MSTUC	Standard flux	20"	3 nm	Code 0	70 mm	E-FKM	No	Ultraclean (UC)	No
CWCK02XST	Standard flux	20"	3 nm	Code 0	83 mm	E-FKM	No	Standard	No
CWCK02XSTUC	Standard flux	20"	3 nm	Code 0	83 mm	E-FKM	No	Ultraclean (UC)	No
CWCK03MST	Standard flux	30"	3 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWCK52MS0	Standard flux	20"	3 nm	Code 5	70 mm	None	No	Standard	No
CWCT01MST	Standard flux	10"	10 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWCT01XST	Standard flux	10"	10 nm	Code 0	83 mm	E-FKM	No	Standard	No
CWCT02MST	Standard flux	20"	10 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWCT02MSTK	Standard flux	20"	10 nm	Code 0	70 mm	E-FKM	Yes	Standard	No
CWCT02XST	Standard flux	20"	10 nm	Code 0	83 mm	E-FKM	No	Standard	No
CWCT51MST	Standard flux	10"	10 nm	Code 5	70 mm	E-FKM	No	Standard	No
CWHF01MST	High Flux	10"	5 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWHF01XST	High Flux	10"	5 nm	Code 0	83 mm	E-FKM	No	Standard	No
CWHF02MST	High Flux	20"	5 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWHK01MST	High Flux	10"	3 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWHK02MST	High Flux	20"	3 nm	Code 0	70 mm	E-FKM	No	Standard	No
CWHK02MSTUC	High Flux	20"	3 nm	Code 0	70 mm	E-FKM	No	Ultraclean (UC)	No