Featured Presentation
Real Time AMC Monitoring with Novel Chemical Ionization Mass Spectrometry at Single-Digit pptv Concentrations
Wednesday, September 13 | 15:10 - 16:10
SESSION 6 — CONTAMINATION CONTROL IN FLUIDSP.
SPEAKERS — Gonzalez-Aguirre, C. Frege, L. Degaches, E. Amade, A. Wild, F. Lopez-Hilfiker
Understand how cleanroom environments can influence FOUP Airborne Molecular Contamination (AMC) control and which material can guarantee better wafer protection.
Featured Poster
Nanoparticle Analyzing Technique Review and Sub-10 nm nanoparticle Sizing methods comparison
By: Suwen Liu
Tuesday, September 12 | 16:30 - 19:00
POSTER SESSION | Location "Witte Roos"
This poster provides a comprehensive review of current nanoparticle analysis methods specifically designed for sub-20 nm particles.
Featured Content
A container of 25 patterned, 300 mm semiconductor wafers may be holding $750 thousand dollars' worth of technology. With that much invested, protecting the purity, safety, and security of the wafers is paramount to your business.
Particles, gels, metals, and airborne molecular contamination (AMC) all affect products, processes, and equipment in varying ways that lead to defective products. Liquid filters and purifiers provide a line of defense to prevent defect-causing contaminants from reaching the wafers and substrates. Whether for point of use or bulk delivery, in chamber or on wafer, in the cleanroom or on a tool, we have a long history of providing advanced liquid, gas, and air purification and filtration solutions to address your productivity and reliability requirements at any technology node.
To achieve optimal wafer yield and reliability, the microelectronics industry needs to address the increased materials consumption requirements and material purity challenges from chemical manufacture to point of use.