The Silicon Precursor Toolbox for
Low-temperature Deposition
Increasing levels of vertical topography on finer structures and lower temperature budgets makes it harder to grow uniform layers of dielectric or patterning films that fulfill the performance demands necessary to produce reliable devices. This problem is not, however, insurmountable. Low-temperature deposition of SiO2 and SiN with ALD and PEALD can protect sensitive layers of the device from thermal damage while creating high-quality films.
A toolbox approach to choosing the most appropriate precursor and plasma combination for a given application makes process development more efficient, benefiting semiconductor device manufacturers and their customer.
Featured White Paper
Liquid or Solid? Navigating Precursor Selection for Next-Generation Semiconductor Deposition
Discover how precursor format impacts film quality, impurity control, and process performance in advanced semiconductor manufacturing. This white paper examines the advantages and challenges of liquid and solid ALD/CVD precursors and offers guidance for selecting the right chemistry for emerging device architectures.
Featured Pictograms
Customizing CMP for Silicon Carbide Wafers
Pictorial explaining how Entegris' customized silicon carbide (SiC) slurry enables specialized CMP processes to cost effectively meet the automotive industry demands for higher operating voltages.
The Silicon Precursor Toolbox: How Entegris Recommends Advanced Materials
Illustration of how customers can benefit from Entegris' toolbox of pre-screened precursors designed to solve low- temperature deposition challenges, and save on costly, time-consuming process development.
Learn more about the silicon precursor toolbox
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Solid chemical delivery systems for ALD and CVD processes
Solid chemical delivery systems providing a stable mass flux and a wide variety of solid materials used in current and future technology nodes.
Liquid and solid precursors for ALD and CVD processes
We provide precursors to meet the industry's technical, quality and economic challenges