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The Silicon Precursor Toolbox for
Low-temperature Deposition
Increasing levels of vertical topography on finer structures and lower temperature budgets makes it harder to grow uniform layers of dielectric or patterning films that fulfill the performance demands necessary to produce reliable devices. This problem is not, however, insurmountable. Low-temperature deposition of SiO2 and SiN with ALD and PEALD can protect sensitive layers of the device from thermal damage while creating high-quality films.
A toolbox approach to choosing the most appropriate precursor and plasma combination for a given application makes process development more efficient, benefiting semiconductor device manufacturers and their customer.
Featured White Paper
The Silicon Precursor Toolbox for Low-temperature Deposition
This paper explains the complexity involved in selecting an ideal precursor and the broad range of precursors available. The number of possible approaches to solve a single integration challenge can be overwhelming and costly. Entegris has developed the precursor toolbox to help chip manufacturers find the best solution quickly.
Featured Pictogram
The Silicon Precursor Toolbox: How Entegris Recommends Advanced Materials
Illustration of how customers can benefit from Entegris' toolbox of pre-screened precursors designed to solve low- temperature deposition challenges, and save on costly, time-consuming process development.
Learn more about the silicon precursor toolbox
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Contact UsProduct Solutions
Solid chemical delivery systems for ALD and CVD processes
Solid chemical delivery systems providing a stable mass flux and a wide variety of solid materials used in current and future technology nodes.
Liquid and solid precursors for ALD and CVD processes
We provide precursors to meet the industry's technical, quality and economic challenges