Dry Etch
Control etch rates and reduce contamination with ultraclean gas delivery solutions.
Reaching your process goals means controlling both what you want and what you don't want to happen during run time. Our clean specialty gas, gas delivery solutions, and specialty chamber coatings can enhance performance and help you maintain higher etch rates by reducing undesirable effects such as micro-masking and etch pit defects.
Dry Etch Solutions
Specialty Gases
Achieve safe and controlled gas delivery of highly toxic, pyrophoric, or corrosive gases.
Gas Contamination Control solutions
Prevent electrical failures with particle, metal, and organic removal solutions with gas filters, diffusers, and purifiers.
Post-Etch Cleaning
Eliminate post-etch residue and hard mask contamination with cleaning solutions.
e-chuck
Prevent wafer processing contamination.
advanced coatings
Prevent chamber corrosion, extend tool life, and increase process consistency.
foups
Prevent ESD charge accumulation and particle generation in wafer handling applications.
Hydrogen Halide Gas Purity
Learn more about reducing moisture and metals contamination that leads to increased wear-and-tear on process equipment and corrosion-related device defects.