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Polycrystalline Silicon Carbide Slurries

High performance slurries for scalable manufacturing of atomically smooth and defect-free polycrystalline silicon carbide (poly-SiC) wafers.
  • Industry-leading polishing slurries that can achieve low surface roughness (Ra < 0.5 nm) on poly-SiC wafers
  • Optimized to work on poly-SiC material with different grain sizes and orientations
  • Advanced formulations that provide a low cost of ownership for polishing poly-SiC materials in a wide range of applications from semiconductor to industrial
  • Slurries are high-volume manufacturing (HVM) ready and compatible with bulk delivery systems
  • Custom solutions are available upon request
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