These PS7-H bulk gas adsorber and getter beds efficiently remove numerous impurities with high reliability, low cost, and high performance.
Uses a combination of heated getter and ambient catalytic adsorption processes to provide ultra-high purity hydrogen (H2) gas for semiconductor applications
Two ambient temperature adsorber vessels remove water (H2O), oxygen (O2), CO, and CO2, while the downstream getter vessel, operated at an elevated temperature, eliminates nitrogen (N2) and methane (CH4)
Two adsorber vessels alternate between purity and regeneration mode, providing continuous purification
Adsorber regeneration is accomplished by back flushing with purified hydrogen at elevated temperatures
Optimized design provides sub-ppb performance in small footprints with flow rates up to 3,333 slpm (200 Nm3/hr)
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