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Impact® 8G Filter

Ultraclean, point-of-use, photoresist and photochemical solvent filtration that delivers superior flow rate performance and reduced microbubble formation capabilities in sub 28 nm technology nodes.

Utilize an enhanced ultraclean technology to reduce particle shedding, microbubble entrapment, and metal and organic extractables
Unique core-fill device structure increases flow rate performance, shortens filter startup times, reduces on-wafer defects, and enhances filter lifetime
Features Oktolex™ membrane technology for use in EUV, ArF, and KrF lithography for 3D NAND, logic, and DRAM devices

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Lithography Technology

Filter Cleaning

Membrane/Media

Form Factor

O-ring

Retention Rating

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CAD CAD Files

CAD drawings may be available for this product. Please use the Part Selector to select a part number to see if they are available.

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Applications Impact® 8G Filter Applications

EUV, ArF-i/D, KrF photoresists
SOG, SOC
Emerging chemistries
Solvents

Specifications

Drawings

Performance Data

Product Specifications

Materials	Membrane	8G, 8G-L	Azora™, UPE, Nylon, Duo, PCM*
		8G UCP, 8G-L UCP	UPE, Nylon, Duo (UPE/Nylon)
	Supports, core, shell		HDPE
	O-ring		Kalrez^® perfluoroelastomer (OF)
Surface area		8G	Azora G1	1200 cm² (1.29 ft²)
			Azora G2	1500 cm² (1.61 ft²)
		8G, 8G UCP	UPE	1200 cm² (1.29 ft²)
		8G, 8G UCP	Nylon	800 cm² (0.86 ft²)
		8G, 8G UCP	Duo	800 cm² (0.86 ft²)
		8G	PCM	1300 cm² (1.40 ft²)
		8G-L	Azora G2	3000 cm² (3.23 ft²)
		8G-L, 8G-L UCP	UPE	2400 cm² (2.58 ft²)
		8G-L	Nylon	1600 cm² (1.72 ft²)
		8G-L, 8G-L UCP	Duo	1600 cm² (1.72 ft²)
		8G-L, 8G-L UCP	PCM	2600 cm² (2.80 ft²)
Retention rating	Azora	Standard: None	UC: None	UCZ: G1, G2
	UPE	Standard: 3, 5, 10, 20 nm, Oktolex G1	UC: None	UCP: 1, 3, 5, 10 nm
	Nylon	Standard: 10, 20 nm	UC: 10 nm	UCP: 5, 20 nm
	Duo	Standard: 5, 10 nm	UC: None	UCP: 1, 3, 5, 10 nm
	PCM*	Standard: 10 nm	UC: None	UCP: None
Maximum operating conditions	Maximum inlet pressure:		0.34 MPa (3.4 bar, 50 psi) @ 25°C (77°F)
	Maximum forward/reverse differential pressure:		0.27 MPa (2.7 bar, 39 psi) @ 25°C (77°F)
	Maximum operating temperature:		40°C (104°F)
Hold up volume	Impact 8G, 8G UCP		55 cc
	Impact 8G-L, 8G-L UCP		110 cc
Compatibility	PGMEA, PGME, and other photochemical solvents (contact your local Entegris applications engineer for details)
Wettability	Spontaneously wets in butyl acetate, PGMEA, PGME, and other photochemical solvents.
Fittings (uses Impact 2 Manifold)	Refer to dimensional drawings
*PCM: surface-modified hydrophilic UPE
Entegris recommends that customers change filters at least annually to ensure optimal filtration performance. Routine annual changeout will also reduce the potential of chemical leakage that can result from excessive usage. Our standard warranty period is 1 year (from Entegris ship date).

Successfully Opted for software Updates

Reference Materials Product Documentation

Published Nov 1, 2021 Data Sheet Impact® 8G Series Photochemical Filters

591.1 kB

Published Dec 1, 2020 Data Sheet Impact® Point-of-Use Photochemical Filters

628.4 kB

Published Jun 7, 2018 Brochure Clean Chemical Delivery Solutions

1.4 MB

Published Jul 1, 2021 Brochure Liquid Filtration Solutions

2.1 MB

Published Jul 1, 2021 Brochure Chasing the Perfect Pattern

1.4 MB

Published Mar 1, 2018 Technical Note Reduced Defectivity Rates Using Oktolex™ Membrane Technology in Photochemical Filtration Applications

710.5 kB

Videos

Impact 8G Photochemical Filter Technology Overview

Part Numbers

Impact® 8G Filter Part Numbers

Part Number	Lithography Technology	Filter Cleaning	Membrane/Media	Form Factor	O-ring	Retention Rating
A2AXC0M01	ArF	Standard	UPE	Short Capsule	OM (On Manifold)	20 nm
A2AXC0MK1	ArF	Standard	UPE	Short Capsule	OF (On Filter) with Kalrez®	20 nm
A2AXCLM01	ArF	Standard	UPE	Long Capsule	OM (On Manifold)	20 nm
A2AXCLMK1	ArF	Standard	UPE	Long Capsule	OF (On Filter) with Kalrez®	20 nm
A2CFC0MK1UCP	EUV, Other	Ultraclean Plus (UCP)	UPE	Short Capsule	OF (On Filter) with Kalrez®	5 nm
A2CFCLM01UCP	EUV, Other	Ultraclean Plus (UCP)	UPE	Long Capsule	OM (On Manifold)	5 nm
A2CFCLMK1UCP	EUV, Other	Ultraclean Plus (UCP)	UPE	Long Capsule	OF (On Filter) with Kalrez®	5 nm
A2CKCLM01UCP	EUV, Other	Ultraclean Plus (UCP)	UPE	Long Capsule	OM (On Manifold)	3 nm
A2CKCLMK1UCP	EUV, Other	Ultraclean Plus (UCP)	UPE	Long Capsule	OF (On Filter) with Kalrez®	3 nm
A2CTC0M01UCP	Immersion	Ultraclean Plus (UCP)	UPE	Short Capsule	OM (On Manifold)	10 nm
A2CTC0MK1UCP	Immersion	Ultraclean Plus (UCP)	UPE	Short Capsule	OF (On Filter) with Kalrez®	10 nm
A2CTCLMK1UCP	Immersion	Ultraclean Plus (UCP)	UPE	Long Capsule	OF (On Filter) with Kalrez®	10 nm
A2DFC0001	EUV, Other	Standard	UPE/Nylon (DUO)	Short Capsule	OM (On Manifold)	5 nm
A2DFC0001UCP	EUV, Other	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Short Capsule	OM (On Manifold)	5 nm
A2DFC00K1	EUV, Other	Standard	UPE/Nylon (DUO)	Short Capsule	OF (On Filter) with Kalrez®	5 nm
A2DFC00K1UCP	EUV, Other	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Short Capsule	OF (On Filter) with Kalrez®	5 nm
A2DFCL0K1	EUV, Other	Standard	UPE/Nylon (DUO)	Long Capsule	OF (On Filter) with Kalrez®	5 nm
A2DFCL0K1UCP	EUV, Other	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Long Capsule	OF (On Filter) with Kalrez®	5 nm
A2DKC0001UCP	EUV, Other	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Short Capsule	OM (On Manifold)	3 nm
A2DKC00K1UCP	EUV, Other	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Short Capsule	OF (On Filter) with Kalrez®	3 nm
A2DKCL001UCP	EUV, Other	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Long Capsule	OM (On Manifold)	3 nm
A2DKCL0K1UCP	EUV, Other	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Long Capsule	OF (On Filter) with Kalrez®	3 nm
A2DTC0001	Immersion	Standard	UPE/Nylon (DUO)	Short Capsule	OM (On Manifold)	10 nm
A2DTC0001UCP	Immersion	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Short Capsule	OM (On Manifold)	10 nm
A2DTC00K1	Immersion	Standard	UPE/Nylon (DUO)	Short Capsule	OF (On Filter) with Kalrez®	10 nm
A2DTC00K1UCP	Immersion	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Short Capsule	OF (On Filter) with Kalrez®	10 nm
A2DTCL0K1	Immersion	Standard	UPE/Nylon (DUO)	Long Capsule	OF (On Filter) with Kalrez®	10 nm
A2DTCL0K1UCP	Immersion	Ultraclean Plus (UCP)	UPE/Nylon (DUO)	Long Capsule	OF (On Filter) with Kalrez®	10 nm
A2MTC0M01	Immersion	Standard	UPE PCM	Short Capsule	OM (On Manifold)	10 nm
A2MTC0MK1	Immersion	Standard	UPE PCM	Short Capsule	On Manifold (OM) with Kalrez®	10 nm
A2MTCLM01	Immersion	Standard	UPE PCM	Long Capsule	OM (On Manifold)	10 nm
A2MTCLMK1	Immersion	Standard	UPE PCM	Short Capsule	OF (On Filter) with Kalrez®	10 nm
A2NTC0001	Immersion	Standard	Nylon	Short Capsule	OM (On Manifold)	10 nm
A2NTC00K1	Immersion	Standard	Nylon	Short Capsule	OF (On Filter) with Kalrez®	10 nm
A2NTCL0K1	Immersion	Standard	Nylon	Long Capsule	OF (On Filter) with Kalrez®	10 nm
A2NXC0001	ArF	Standard	Nylon	Short Capsule	OM (On Manifold)	20 nm
A2NXC00K1	ArF	Standard	Nylon	Short Capsule	OF (On Filter) with Kalrez®	20 nm
A2NXCL001	ArF	Standard	Nylon	Long Capsule	OM (On Manifold)	20 nm
A2NXCL0K1	ArF	Standard	Nylon	Long Capsule	OF (On Filter) with Kalrez®	20 nm
A2SFC0M01	EUV, Other	Standard	UPE	Short Capsule	OM (On Manifold)	5 nm
A2SFC0MK1	EUV, Other	Standard	UPE	Short Capsule	OF (On Filter) with Kalrez®	5 nm
A2SFC0MKTUC	EUV, Other	Ultraclean (UC)	UPE	Short Capsule	OF (On Filter) with Kalrez®	5 nm
A2SFCLM01	EUV, Other	Standard	UPE	Long Capsule	OM (On Manifold)	5 nm
A2SFCLMK1	EUV, Other	Standard	UPE	Long Capsule	OF (On Filter) with Kalrez®	5 nm
A2SKC0M01	EUV, Other	Standard	UPE	Short Capsule	OM (On Manifold)	3 nm
A2SKC0MK1	EUV, Other	Standard	UPE	Short Capsule	OF (On Filter) with Kalrez®	3 nm
A2SKCLM01	EUV, Other	Standard	UPE	Long Capsule	OM (On Manifold)	3 nm
A2SKCLMK1	EUV, Other	Standard	UPE	Long Capsule	OF (On Filter) with Kalrez®	3 nm
A2STC0M01	Immersion	Standard	UPE	Short Capsule	OM (On Manifold)	10 nm
A2STC0MK1	Immersion	Standard	UPE	Short Capsule	OF (On Filter) with Kalrez®	10 nm
A2STCLM01	Immersion	Standard	UPE	Long Capsule	OM (On Manifold)	10 nm
A2STCLMK1	Immersion	Standard	UPE	Long Capsule	OF (On Filter) with Kalrez®	10 nm