Impact® 2 Filter Manifold (8G, 2-V2)
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Applications
- Semiconductor point-of-use photolithography applications
- Chemistries including photoresist, photochemicals, solvents
Specifications
| Materials | Wetted surfaces | PFA |
| Nonwetted surfaces | Stainless steel | |
| Release tab | POM | |
| Maximum operating conditions | Maximum inlet pressure | 0.39 MPa (3.9 bar, 56 psi) @ 25°C (77°F) |
| Maximum operating temperature | 40°C (104°F) | |
| Compatibility | Visit our Chemical Compatibility web page | |
| Note: The Impact 2 filter manifold is designed and tested to be used with Entegris filters and flushing shell only. The warranty will be voided if it is used with non-Entegris products. | ||
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Part Numbers
| Part Number | Fitting Type | Inlet/Outlet Fitting Size | Vent Size |
|---|---|---|---|
| A2MP2220T | Super Type Pillar® | 1/4" | 1/4" |
| A2MX1140TXW | Flowell® 60 | 1/8" | 4 mm |
| A2MX2210TX | Flowell® 60 | 1/4" | 1/8" |
| A2MX2220T | Flowell® 60 | 1/4" | 1/4" |
| A2MX2240T | Flowell® 60 | 1/4" | 4 mm |
| A2MX4440TW | Flowell® 60 | 4 mm | 4 mm |
| A2MZ1140TW | Flowell® 80 | 1/8" | 4 mm |
| A2MZ2220T | Flowell® 80 | 1/4" | 1/4" |
| A2MZ2240T | Flowell® 80 | 1/4" | 4 mm |
| A2MZ4440TW | Flowell® 80 | 4 mm | 4 mm |