The Lithographer's Toolkit
We’re all obsessed with creating that perfect circuit pattern to improve wafer yield, parametric performance, and device reliability. What’s the connection between defects and materials purity? We’re debunking the contamination control myths to reduce your process variations. The lithographer’s toolkit provides a practical guide to reduce process variations that threaten your semiconductor fab performance.
The Lithographer's Toolkit
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Join Jennifer Braggin, Strategic Applications Technologist, as she explores the importance of understanding the interaction of the material science and the chemistry with the fluid or gas flow path to prevent interruptions when trying to achieve the perfect lithography pattern. Want to learn more? Register today to download the recording.
Featured Pictogram
Filtration has an easily understood goal: remove all contaminants from a gas or a fluid stream. However, there are many common myths about how filtration actually works. It is important to dispel these myths, and Entegris can help you understand the facts and how they inform the use of contamination control technologies in semiconductor manufacturing.
Filtration Fundamentals: Membrane Wetting (Part I)
Watch as Dr. Aiwen Wu, Senior Applications Engineer, demonstrates the different wettability properties of various polymer membranes when exposed to DI water and IPA. He also explains how Entegris can apply surface modification technology to purposely change membrane wettability properties to enhance liquid filtration performance in specific applications. Runtime: 04:59 mins.
Filtration Fundamentals: Membrane Dewetting (Part II)
Watch as Dr. Aiwen Wu, Senior Applications Engineer, demonstrates the hydrophobic nature of a native PTFE membrane and a surface modified PTFE (non-dewetted) membrane when exposed to DI water and IPA. He also explains what prewetting accomplishes and the benefit of surface modified membranes for use in applications with strong acids, bases, high-temperature water, and surfactants. Runtime: 03:19 mins.
Featured White Paper
A Practical Toolkit to Reduce Lithography Process Variability: Filtering Out the Noise in Your Process
Liquid filtration primarily uses polymer membrane technologies as selective barriers that permit certain constituents in a fluid stream to pass through while retaining or rejecting others. A common misconception about membranes is that they are simply sieves that have one consistent pore in one barrier layer that retains all contaminants larger than the pore size. The selection of a membrane architecture is one critical factor in designing your unique contamination control solutions.
Featured Technical Note
An Update on the Improvement of Point-of-Use Filtration of Metal Oxide Photoresists Cover
Learn about a new class of photoresist designed to provide high sensitivity and resolution for EUV lithography.
Pattern Integrity Improvement Solutions
A first of their kind, Purasol™ solvent purifiers remove a wide variety of metal microcontaminants found in organic solvents used in photoresist applications. Using uniquely tailored membrane technology, these versatile purifiers reduce defects in critical process streams.
Revolutionary membrane technology to remove critical photochemical contaminants by enhancing the native retention mechanisms of each membrane type to match the needs of each chemistry. This technology can be applied to various filters to achieve maximum contaminant removal and increase device performance.
Best-in-class, contamination control solution in advanced photochemical applications. A unique, cage-like morphology membrane reduces on-wafer defectivity while providing sufficient flow and superior filter cleanliness. The polyimide construction offers broad chemical compatibility with photoresist, photochemicals, and acidic chemicals.
Without introducing unwanted contamination or physical damage, our EUV reticle pods EUV lithography safe storage and protection during lithographic patterning, inspection, cleaning, and repair.
The dual-pod design offers an inner and outer pod to maintain a contamination-free environment. The EUV pod is compatible with lithography equipment and maintains a clean, dry atmosphere for the reticles both with and without pellicles.
IntelliGen® photochemical dispense systems use state-of-the-art, two-stage dispense technology with a built-in Impact® 8G filter manifold to enable independent filtration and dispense. Dispense systems are available for low-, medium-, and high-viscosity fluids. Communication systems enable you to network pumps for efficient process monitoring.
Chemicals can be susceptible to particle contamination that may be introduced during chemical transport or transfer from bulk chemical containers to smaller drums or transportation packs. Mitigate this risk with clean, contamination-controlled NOWPak® liner-based bottle and canister systems that help protect valuable materials throughout filling, transporting, and dispensing operations.
GateKeeper® automatic regeneration gas purification systems remove gaseous contaminants down to the part-per-trillion level. They provide a cost-effective way to manage gas supply purity and prevent contamination in your process without damaging tools.
Control contaminants in the entire fab and protect both process equipment and wafers from the damaging effects of AMC with VaporSorb™ filters. Designed from the ground up for gas-phase contamination removal and low outgassing, these chemically-clean filters enable the latest technology nodes.