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SemiChem Advanced Process Monitor

A wet chemical monitoring system that automatically samples, analyzes, and reports quantitative chemical concentration of critical processes, helping to increase product yields.

Provides the industry's most precise monitoring available to maintain process chemical composition and integrity
Detects process excursions in volatile chemistries before loss of product quality
Transitioning the lab technology to the process allows fast and accurate process control
Maintains a mean time between failures (MTBF) >8500 hours
Provides class-leading chemical concentration data allowing the slurry/chemical distribution system to deliver exact chemical concentration

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Applications SemiChem Advanced Process Monitor Applications

Worldwide, we have nearly 3,000 SemiChem APM systems installed for controlling metal CMP concentration. It is a trusted, central tool for controlling CMP peroxide, and is proven to provide exceptional performance in all wet chemical applications in the microelectronics environments including:

Copper, tungsten, barrier, and metal CMP
Formulated cleans
DSP+
Wet etch, nitride etch
PAN etch, Piranha etch
HF
Wastewater

Specifications

Drawings

Product Specifications

Analysis methods	Potentiometry, standard addition, photometry
Accuracy of potentiometry*	±0.2% of displayed value
Accuracy of standard addition*	±2.0% of displayed value
Precision of potentiometry*	±0.2% relative error
Precision of standard addition*	±2.0% relative error
Measurement time	>5 minutes/analysis (application dependent)
Calibration interval	at start-up**
Sample consumption	<5 mL/analysis
Sample size	0.05 to 5 mL (application dependent)
Sample temperature	up to 93°C (200°F)
Water consumption	<1000 mL/analysis
Sample inlet/return	<207 kPa (30 psi), 0.5 L/min
	1/4" OD flare fitting, 1" FPT containment coupling
Deionized water	138 to 276 kPa (20 to 40 psi)
	2.0 L/min
	1/4" OD flare fitting
CDA	414 to 552 kPa (60 to 80 psi)
	1/4" OD quick fitting
Drains	Process: 3/4" NPT gravity drain	Cabinet: 1/2" NPT gravity
Power	110/220 VAC, 50/60 Hz, 1/0.5 A field switchable
Exhaust	1 7/8" OD @ 17 CFM
*Refers to hardware only. External factors such as applications, chemistry, and process conditions can affect system accuracy and precision.

Standard Features	Optional Features
Four 4-20 mA analog outputs Eight programmable relays Ethernet and RS232 serial Color Touchscreen Single measuring cell Integrated reagent storage Single sample point One 5 mL digital burette Multiple sensor inputs	Multiple sample points Additional 5 mL digital burettes Additional sensors Safety interlocks Reagent low level detection

Successfully Opted for software Updates

Reference Materials Product Documentation

Published Feb 18, 2021 Data Sheet SemiChem Advanced Process Monitor

1.1 MB

Published Feb 18, 2021 Data Sheet SemiChem Advanced Process Monitor - A4

1.1 MB

Published Mar 1, 2021 Brochure Process Monitoring Solutions

611.2 kB

Published Jun 1, 2021 Brochure Synergies to Improve CMP Yield

1.5 MB

Published Mar 1, 2021 Application Note SemiChem APM 200 with HF and Total Acid in DSP+ Process

593.3 kB

Published Mar 1, 2021 Application Note SemiChem APM 200 with H₂O₂ in CMP Process

487.8 kB

Published Apr 1, 2021 Application Note SemiChem APM 200 with HF and H²O² in DSP+

545.5 kB

Published Mar 1, 2021 Manual and Guide SemiChem APMi 200

4.4 MB

Published Jul 1, 2021 Manual and Guide SemiChem APM 200, Single Cell Floor Mount

4.9 MB

Published Jun 1, 2021 Manual and Guide SemiChem APM 200, Single Cell Wall Mount

4.5 MB

Published May 1, 2021 Manual and Guide SemiChem APM 200, Dual Cell Floor Mount

7.4 MB

Published Jun 1, 2021 Manual and Guide SemiChem APM 200, Dual Cell Floor Mount with Grabport

7.7 MB

SemiChem Advanced Process Monitor

Specifications

Standard Features

Optional Features