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SemiChem Advanced Process Monitor

A wet chemical monitoring system that automatically samples, analyzes, and reports quantitative chemical concentration of critical processes, helping to increase product yields.

Provides the industry's most precise monitoring available to maintain process chemical composition and integrity
Detects process excursions in volatile chemistries before loss of product quality
Transitioning the lab technology to the process allows fast and accurate process control
Maintains a mean time between failures (MTBF) >8500 hours
Provides class-leading chemical concentration data allowing the slurry/chemical distribution system to deliver exact chemical concentration

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Applications SemiChem Advanced Process Monitor Applications

Worldwide, we have nearly 3,000 SemiChem APM systems installed for controlling metal CMP concentration. It is a trusted, central tool for controlling CMP peroxide, and is proven to provide exceptional performance in all wet chemical applications in the microelectronics environments including:

Copper CMP
Tungsten CMP
Barrier CMP
Metal CMPs
Formulated cleans
DSP+
Wet etch
Nitride etch
PAN etch
Piranha etch
HF
Wastewater

Specifications

Drawings

Product Specifications

Analysis methods	Potentiometry, standard addition, photometry
Accuracy of potentiometry*	±0.2% of displayed value
Accuracy of standard addition*	±2.0% of displayed value
Precision of potentiometry*	±0.2% relative error
Precision of standard addition*	±2.0% relative error
Measurement time	>5 minutes/analysis (application dependent)
Calibration interval	at start-up**
Sample consumption	<5 mL/analysis
Sample size	0.05 to 5 mL (application dependent)
Sample temperature	up to 93°C (200°F)
Water consumption	<1000 mL/analysis
Sample inlet/return	<207 kPa (30 psi)
	0.5 L/min
	1/4" OD flare fitting
	1" FPT containment coupling
Deionized water	138 to 276 kPa (20 to 40 psi)
	2.0 L/min
	1/4" OD flare fitting
CDA	414 to 552 kPa (60 to 80 psi)
	1/4" OD quick fitting
Process drain	3/4" NPT gravity drain
Cabinet drain	1/2" NPT gravity drain
Power	110/220 VAC, 50/60 Hz, 1/0.5 A field switchable
Exhaust	1 7/8" OD @ 17 CFM
*Refers to hardware only. External factors such as applications, chemistry, and process conditions can affect system accuracy and precision.

Standard Features			Optional Features
Four 4-20 mA analog outputs Eight programmable relays Ethernet and RS232 serial Color Touchscreen Single measuring cell Integrated reagent storage Single sample point One 5 mL digital burette Multiple sensor inputs			Multiple sample points Additional 5 mL digital burettes Additional sensors Safety interlocks Reagent low level detection

Successfully Opted for software Updates

SemiChem Advanced Process Monitor

Specifications

Standard Features

Optional Features