-
Sign In
Sign In
Forgot Password?Please enter the email address for your account. A link to change your password will be emailed to you.
All Fields Required - Sign Out
- My Account
-
Quick Order Pad
Enter Part Numbers below to add them to your cart
Need to order more than 3 items?
Go to the Quick Order Page - Quick Order Pad
- Contact Us
- Cart
- Language
- Currency
SemiChem Advanced Process Monitor
Interested in SemiChem Advanced Process Monitor?
Contact your Entegris account manager or
Top of page
Applications
Worldwide, we have nearly 3,000 SemiChem APM systems installed for controlling metal CMP concentration. It is a trusted, central tool for controlling CMP peroxide, and is proven to provide exceptional performance in all wet chemical applications in the microelectronics environments including:
- Copper CMP
- Tungsten CMP
- Barrier CMP
- Metal CMPs
- Formulated cleans
- DSP+
- Wet etch
- Nitride etch
- PAN etch
- Piranha etch
- HF
- Wastewater
Specifications
Analysis methods | Potentiometry, standard addition, photometry | ||
Accuracy of potentiometry* | ±0.2% of displayed value | ||
Accuracy of standard addition* | ±2.0% of displayed value | ||
Precision of potentiometry* | ±0.2% relative error | ||
Precision of standard addition* | ±2.0% relative error | ||
Measurement time | >5 minutes/analysis (application dependent) | ||
Calibration interval | at start-up** | ||
Sample consumption | <5 mL/analysis | ||
Sample size | 0.05 to 5 mL (application dependent) | ||
Sample temperature | up to 93°C (200°F) | ||
Water consumption | <1000 mL/analysis | ||
Sample inlet/return | <207 kPa (30 psi) | ||
0.5 L/min | |||
1/4" OD flare fitting | |||
1" FPT containment coupling | |||
Deionized water | 138 to 276 kPa (20 to 40 psi) | ||
2.0 L/min | |||
1/4" OD flare fitting | |||
CDA | 414 to 552 kPa (60 to 80 psi) | ||
1/4" OD quick fitting | |||
Process drain | 3/4" NPT gravity drain | ||
Cabinet drain | 1/2" NPT gravity drain | ||
Power | 110/220 VAC, 50/60 Hz, 1/0.5 A field switchable | ||
Exhaust | 1 7/8" OD @ 17 CFM | ||
*Refers to hardware only. External factors such as applications, chemistry, and process conditions can affect system accuracy and precision. |
Standard Features |
Optional Features |
||
|
|
Successfully Opted for software Updates
Related Products