SemiChem Advanced Process Monitor
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Reference Materials
Applications
Worldwide, we have nearly 3,000 SemiChem APM systems installed for controlling metal CMP concentration. It is a trusted, central tool for controlling CMP peroxide, and is proven to provide exceptional performance in all wet chemical applications in the microelectronics environments including:
- Copper, tungsten, barrier, and metal CMP
- Formulated cleans
- DSP+
- Wet etch, nitride etch
- PAN etch, Piranha etch
- HF
- Wastewater
Specifications
| Analysis methods | Potentiometry, standard addition, photometry | |||
| Accuracy of potentiometry* | ±0.2% of displayed value | |||
| Accuracy of standard addition* | ±2.0% of displayed value | |||
| Precision of potentiometry* | ±0.2% relative error | |||
| Precision of standard addition* | ±2.0% relative error | |||
| Measurement time | >5 minutes/analysis (application dependent) | |||
| Calibration interval | At start-up** | |||
| Sample consumption | <5 mL/analysis | |||
| Sample size | 0.05 to 5 mL (application dependent) | |||
| Sample temperature | Up to 93°C (200°F) | |||
| Water consumption | <1000 mL/analysis | |||
| Sample inlet/return | <207 kPa (30 psi), 0.5 L/min | |||
| 1/4" OD flare fitting, 1" FPT containment coupling | ||||
| Deionized water | 138 to 276 kPa (20 to 40 psi) | |||
| 2.0 L/min | ||||
| 1/4" OD flare fitting | ||||
| CDA | 414 to 552 kPa (60 to 80 psi) | |||
| 1/4" OD quick fitting | ||||
| Drains | Process: 3/4" NPT gravity | Cabinet: 1/2" NPT gravity | ||
| Power | 110/220 VAC, 50/60 Hz, 1.0/0.5A field switchable | |||
| Exhaust | 1 7/8" OD @ 17 CFM | |||
| *Refers to hardware only. External factors such as applications, chemistry, and process conditions can affect system accuracy and precision. | ||||
| **This does not include calibration of pH or Ion Selective sensor. Please refer to the Installation and Operating Manual for more information. | ||||
Standard Features |
Optional Features |
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Successfully Opted for software Updates
Published Mar 1, 2021
Application Note
SemiChem APM 200 with HF and Total Acid in DSP+ Process
593.3 kB
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