SemiChem Advanced Process Monitor
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Reference Materials
Applications
Worldwide, we have nearly 3,000 SemiChem APM systems installed for controlling metal CMP concentration. It is a trusted, central tool for controlling CMP peroxide, and is proven to provide exceptional performance in all wet chemical applications in the microelectronics environments including:
- Copper, tungsten, barrier, and metal CMP
- Formulated cleans
- DSP+
- Wet etch, nitride etch
- PAN etch, Piranha etch
- HF
- Wastewater
Specifications
| Analysis methods | Potentiometry, standard addition, photometry | |||
| Accuracy of potentiometry* | ±0.2% of displayed value | |||
| Accuracy of standard addition* | ±2.0% of displayed value | |||
| Precision of potentiometry* | ±0.2% relative error | |||
| Precision of standard addition* | ±2.0% relative error | |||
| Measurement time | >5 minutes/analysis (application dependent) | |||
| Calibration interval | At start-up** | |||
| Sample consumption | <5 mL/analysis | |||
| Sample size | 0.05 to 5 mL (application dependent) | |||
| Sample temperature | Up to 93°C (200°F) | |||
| Water consumption | <1000 mL/analysis | |||
| Sample inlet/return | <207 kPa (30 psi), 0.5 L/min | |||
| 1/4" OD flare fitting, 1" FPT containment coupling | ||||
| Deionized water | 138 to 276 kPa (20 to 40 psi) | |||
| 2.0 L/min | ||||
| 1/4" OD flare fitting | ||||
| CDA | 414 to 552 kPa (60 to 80 psi) | |||
| 1/4" OD quick fitting | ||||
| Drains | Process: 3/4" NPT gravity | Cabinet: 1/2" NPT gravity | ||
| Power | 110/220 VAC, 50/60 Hz, 1.0/0.5A field switchable | |||
| Exhaust | 1 7/8" OD @ 17 CFM | |||
| *Refers to hardware only. External factors such as applications, chemistry, and process conditions can affect system accuracy and precision. | ||||
| **This does not include calibration of pH or Ion Selective sensor. Please refer to the Installation and Operating Manual for more information. | ||||
Standard Features |
Optional Features |
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Technical Assistance
To lessen your production downtime, we offer Expedited Instrumentation Technical Assistance.Successfully Opted for software Updates
Published Mar 1, 2021
Application Note
SemiChem APM 200 with HF and Total Acid in DSP+ Process
593.3 kB