Process Monitoring Systems
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- Detecting oversized particles in chemical mechanical planarization (CMP) slurries
- Nanoparticle online analysis
Specifications
System Features
AccuSizer Mini Systems for CMP Slurry Monitoring
The AccuSizer Mini system is engineered using a modular design that allows us to match sensors and fluidics options to customer slurries and process equipment. Our systems generate the highest accuracy and resolution results quickly and at count rates higher than any other technology. This improves statistics to assure detection of large particle counts (LPC) that reduce yields.
- A variety of custom autodilution modules assure the perfect concentration is delivered to the sensor for measurement
- Using the single particle optical sizing (SPOS) technique, a range of sensors operating at focused size ranges and concentration limits provide the highest accuracy results
- Use this system to continuously monitor LPC in your CMP slurry delivery system and as a tool to optimize filtration and other process conditions
AccuSizer Mini FX System
- Range: 0.65 - 20 µm, up to 106 particles/mL
- Single stage dilution fluidics
- Ideal for ceria CMP slurries
AccuSizer Mini LE System
- Range: 0.5 - 400 µm, up to 9,000 particles/mL
- Single or dual stage dilution fluidics
- Ideal for silica CMP slurries
AccuSizer Mini FX-Nano System
- Range: 0.15 - 10 µm, up to 106 particles/mL
- Exponential dilution fluidics
- Ideal for clean, colloidal CMP slurries
Nicomp Online System
An unmonitored process is a sure path to lost product, costly downtime, and reduced profits. Our Nicomp online system allows users to monitor a manufacturing process to ensure a high quality product without waste.
Nicomp N3000 Online System
- Using dynamic light scattering (DLS) technology, this online system couples a compact optics bench with our unique autodilution fluidics, all rugged enough for the production environment
- Autodilution allows even concentrated materials like paint to be monitored
- Special trending graphs in the software can be used to set out-of-control (OOC) limits that will signal operations when the end point is reached
- The system is small enough to be integrated with many nanoparticle processes, providing real-time particle size distributions
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