-
Sign In
Sign In
Forgot Password?Please enter the email address for your account. A link to change your password will be emailed to you.
All Fields Required - Sign Out
- My Account
-
Quick Order Pad
Enter Part Numbers below to add them to your cart
Need to order more than 3 items?
Go to the Quick Order Page - Quick Order Pad
- Contact Us
- Cart
- Language
- Currency
Enabling Advanced Lithography (EUV)
As semiconductor geometries grew smaller (sub 14nm), EUV lithography was developed to successfully scale down complex patterns on wafers for the most advanced technologies.
Extreme Ultraviolet reticle pods are highly-specialized pieces of equipment that fulfill a critical role in EUV lithography. They must protect the reticle during use, storage, and transportation while not introducing additional contamination or damage. Pods must be compatible with lithography equipment and be able to maintain a clean, dry atmosphere for the reticle. Precisely designed dual-pod configurations achieve these goals for reticles both with and without pellicles, ensuring the future of EUV lithography.
Featured White Paper
Enabling Advanced Lithography: The Challenges of Storing and Transporting EUV Reticles
This paper explains the challenges inherent in designing pods for EUV lithography and proposes solutions that will allow more fabs to implement advanced lithography nodes at their facilities.
Featured White Paper
EUV Enablement: Solving defect challenges in the EUV process
This white paper explains why specific advances are necessary for the success and expansion of EUV lithography.
Featured Pictogram
Protecting and Transporting Extreme Ultraviolet (EUV) Reticles
Reliable patternmaking at such a fine scale requires ultraclean reticles. We can help you through your challenges of storing and transporting EUV reticles.
Learn more about our EUV lithography solutions
FIND AN OFFICE LOCATION OR SPEAK WITH AN EXPERT
Contact UsProduct Solution
Advanced extreme ultraviolet light (EUV) reticle pod is designed to provide defect-free protection of EUV reticles enabling the high-volume manufacturing of advanced technology nodes during storage, handling and vacuum-transfer operations.