Enabling Advanced Lithography (EUV)
As semiconductor geometries grew smaller (sub 14 nm), EUV lithography was developed to successfully scale down complex patterns on wafers for the most advanced technologies.
Extreme Ultraviolet reticle pods are highly-specialized pieces of equipment that fulfill a critical role in EUV lithography. They must protect the reticle during use, storage, and transportation while not introducing additional contamination or damage. Pods must be compatible with lithography equipment and be able to maintain a clean, dry atmosphere for the reticle. Precisely designed dual-pod configurations achieve these goals for reticles both with and without pellicles, ensuring the future of EUV lithography.