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Liquid Filters


Featured Technical Note

High Throughput Ultraclean UPE Filters for Sub-5 nm Node Aqueous Applications

Featured Technical Note

High Throughput Ultraclean UPE Filters for Sub-5 nm Node Aqueous Applications

Featured Technical Note

High Throughput Ultraclean UPE Filters for Sub-5 nm Node Aqueous Applications
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Next generation, point-of-dispense, CMP slurry filters for large and fine particle reduction
Brand Name
  • Planarcap®
Chemistry
  • Slurry
Installation Point
  • Point of Dispense
Industry
  • Semiconductor
Point-of-dispense CMP slurry filter to prevent micro-scratches
Brand Name
  • Planarcap®
Chemistry
  • Slurry
Feature Size (Layer)
  • >90 nm
Installation Point
  • Point of Dispense
Best-in-class, point-of-dispense CMP slurry filter to prevent micro-scratches
Brand Name
  • Planarcap®
Chemistry
  • Slurry
Feature Size (Layer)
  • <10 nm
  • 14-22 nm
  • 28-90 nm
  • >90 nm
Installation Point
  • Point of Dispense
Point-of-dispense CMP slurry filter to prevent micro-scratches
Brand Name
  • Planarcap®
Chemistry
  • Slurry
Feature Size (Layer)
  • 28-90 nm
  • >90 nm
Installation Point
  • Point of Dispense
Next generation slurry filters for large and fine particle reduction
Brand Name
  • Planargard®
Chemistry
  • Slurry
Installation Point
  • Bulk
Industry
  • Semiconductor
Bulk CMP slurry filter for 65 nm or greater technology nodes to prevent micro-scratches
Brand Name
  • Planargard®
Chemistry
  • Slurry
Feature Size (Layer)
  • 28-90 nm
  • >90 nm
Installation Point
  • Bulk
Best-in-class, bulk CMP slurry filter for sub 45 nm technology nodes to prevent micro-scratches
Brand Name
  • Planargard®
Chemistry
  • Slurry
Feature Size (Layer)
  • <10 nm
  • 14-22 nm
  • 28-90 nm
  • >90 nm
Installation Point
  • Bulk
Point of tool and dispense slurry filter with reliable contaminant retention and flow rate performance in data storage substrate polishing applications.
Brand Name
  • ProcessGard®
Chemistry
  • Slurry
Feature Size (Layer)
  • N/A
Installation Point
  • Point of Tool
  • Point of Dispense
Polypropylene multilayer depth pleated filters for color resist, ink, slurry, millbase, and process water in the electronics industry
Brand Name
  • ProcessGard®
Chemistry
  • Acids
  • Solvent
  • Slurry
  • DI Water
  • Color Resist
  • Ink
Industry
  • Semiconductor
Process
  • CMP
Utilizing patented, multilayer depth-type media, Solaris APR (advanced particle reduction) filters effectively reduce most large abrasive and slurry agglomerates in advanced node CMP processes.
Brand Name
  • Solaris®
Chemistry
  • Slurry
Installation Point
  • Point of Tool
Industry
  • Semiconductor
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