Liquid Filters
Contamination control technologies for chemicals, water, solvents and photochemicals.
Controlling contaminants in process streams is a vital way to improve operating efficiency and enable technology advances. We offer a variety of membrane and media to match the chemical compatibility and process conditions of each manufacturing environment.
Featured Technical Note
High Throughput Ultraclean UPE Filters for Sub-5 nm Node Aqueous Applications
Featured Technical Note
High Throughput Ultraclean UPE Filters for Sub-5 nm Node Aqueous Applications
Featured Technical Note
High Throughput Ultraclean UPE Filters for Sub-5 nm Node Aqueous Applications
Showing 13 Products
Next generation, point-of-dispense, CMP slurry filters for large and fine particle reduction
Brand Name
- Planarcap®
- Slurry
- Point of Dispense
- Semiconductor
Point-of-dispense CMP slurry filter to prevent micro-scratches
Brand Name
- Planarcap®
- Slurry
- >90 nm
- Point of Dispense
Best-in-class, point-of-dispense CMP slurry filter to prevent micro-scratches
Brand Name
- Planarcap®
- Slurry
- <10 nm
- 14-22 nm
- 28-90 nm
- >90 nm
- Point of Dispense
Point-of-dispense CMP slurry filter to prevent micro-scratches
Brand Name
- Planarcap®
- Slurry
- 28-90 nm
- >90 nm
- Point of Dispense
Next generation slurry filters for large and fine particle reduction
Brand Name
- Planargard®
- Slurry
- Bulk
- Semiconductor
Bulk CMP slurry filter for 65 nm or greater technology nodes to prevent micro-scratches
Brand Name
- Planargard®
- Slurry
- 28-90 nm
- >90 nm
- Bulk
Best-in-class, bulk CMP slurry filter for sub 45 nm technology nodes to prevent micro-scratches
Brand Name
- Planargard®
- Slurry
- <10 nm
- 14-22 nm
- 28-90 nm
- >90 nm
- Bulk
Point of tool and dispense slurry filter with reliable contaminant retention and flow rate performance in data storage substrate polishing applications.
Brand Name
- ProcessGard®
- Slurry
- N/A
- Point of Tool
- Point of Dispense
Polypropylene multilayer depth pleated filters for color resist, ink, slurry, millbase, and process water in the electronics industry
Brand Name
Industry
- ProcessGard®
- Acids
- Solvent
- Slurry
- DI Water
- Semiconductor
- CMP
Utilizing patented, multilayer depth-type media, Solaris APR (advanced particle reduction) filters effectively reduce most large abrasive and slurry agglomerates in advanced node CMP processes.
Brand Name
- Solaris®
- Slurry
- Point of Tool
- Semiconductor
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