Contamination Control

Contamination Control


Contamination control in a semiconductor fab is crucial for achieving acceptable device yields as feature size decreases and 3D structures proliferate. Advanced filtration and purification of air, bulk or specialty gas, and chemical throughout its process life cycle has become a critical aspect in reducing defects and enabling higher yields. IDMs (integrated device manufacturers) continue to tighten the acceptable specifications on parameters such as particles, metals, and organics in every chemical and gas they receive. 

Particles, gels, metals, and airborne molecular contamination (AMC) all affect products, processes, and equipment in varying ways that lead to defective products. Liquid filters and purifiers provide a line of defense to prevent defect-causing contaminants from reaching the wafers and substrates. Whether for point of use or bulk delivery, in chamber or on wafer, in the cleanroom or on a tool, we have a long history of providing advanced liquid, gas, and air purification and filtration solutions to address your productivity and reliability requirements at any technology node.

The Fight for Purity in Chemical Manufacturing

The Fight for Purity in Chemical Manufacturing

The digital transformation we are all experiencing as consumers present new challenges to material makers, as well as opportunities. Contamination control remains one of the largest challenges as integrated circuit (IC) technology advances. Better contamination control can significantly improve yield, and a one percent yield improvement can mean up to $150 million per year in net profit.

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