Join Us
As a leader in materials science and materials purity, Entegris offers solutions that cover the entirety of the surface preparation and cleaning process. Our chemical mechanical planarization (CMP) slurry, post-CMP cleans, filters, purifiers, fluid handling, and process monitoring products provide opportunities to solve today’s challenges in CMP, photolithography, and wet etch and clean applications.
Visit us during the poster and networking session to learn how we’re advancing surface preparation and cleaning sciences!
FEATURED POSTERS
April 24 | 5:30 – 7:30 p.m. | Wild Horse Pass Resort
Use of Hybrid Metrology Approach to Develop Holistic Filtration Solutions in Hydrogen Peroxide
Kusum Maharjan, Entegris Applications Engineering Manager
Event Related Content
Slurries
Learn how Entegris CMP slurry isoptimized not just for silicon wafers, but also for ultra-hard surfaces that include silicon carbide, sapphire, diamond, and gallium nitride. Here at Entegris, we don’t just bring the slurry – we also deliver a robust research and development capability that can help our customers solve highly specific challenges with lower costs and higher yields.
Purasol™ SP/SN Solvent Purifiers
Efficiently removes both dissolved and colloidal metal contaminants from a variety of ultrapure, polar and nonpolar solvents including difficult to remove ketones like cyclohexanone. These products offer superior cleanliness versus other purifier technologies.
Protego® Plus IPA Purifiers
These highly efficient solvent purifier/filters provide superior metal and particle removal from critical gate-cleaning front-end-of-line applications in sub-45 nm technology nodes.
Torrento® Aggressive Acid and Base Filters
Advanced point-of-use filtration solution that meets N3 and N5 customer requirements for lowest on-wafer particle counts.
Astera™ Dilute Acid and Base FiltersAstera™ Dilute Acid and Base Filters
High-purity, dilute acid and base defect reduction solution that improves wafer yield performance with advanced PAS membrane.
Solaris® APR CMP Disposable Filter
Utilizing multilayer depth-type media, APR (advanced particle reduction) series filters effectively reduce most large abrasive and slurry agglomerates in advanced node CMP processes.
Particle Characterization
Entegris helps chipmakers eliminate guesswork from slurry health with real-time particle characterization systems. With solutions that provide online measurements with single particle optical sizing, dynamic light scattering, and zeta potential, you’ll be able to unlock a multidimensional view of your critical process liquids to avoid defectivity.
Post-CMP Cleaning Solutions
Entegris offers a broad array of post-CMP cleaning solutions for different scenarios. Whether you need to protect thin films, clean hydrophobic surfaces, minimize corrosion, or eliminate contaminants, we offer a product that’s optimized for your needs.
